Masami Akimoto
Tokyo Electron
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Publication
Featured researches published by Masami Akimoto.
Robotics and Computer-integrated Manufacturing | 1993
Kiyohisa Tateyama; Masami Akimoto; Mitsuru Ushijima
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Japanese Journal of Applied Physics | 2000
Shinichi Ito; Tatsuhiko Ema; Takahiro Kitano; Kohtaro Sho; Yukihiko Esaki; Masateru Morikawa; Kazuhiro Takeshita; Masami Akimoto; Katsuya Okumura
A novel nozzle-scan coating (NS-coating) method is useful for reducing the coated volume and its cost. We define the (waste-fluid rate) WFR as the ratio of the waste fluid to the fluid supplied on the wafer. In conventional spin-coating, the WFR is about 1500%. In the case of the extrusion-spin coating, the WFR decreases to 203%. But using the NS-coating with low speed and large acceleration, the WFR of the raw materials drastically decreased to 30%. This paper introduces some lithographic performances of NS-coating film of KrF chemical amplified resist that was coated with low WFR condition.
Archive | 2012
Takahiro Kitano; Masateru Morikawa; Masami Akimoto; Kazuhiro Takeshita
Archive | 2007
Keizo Hasebe; Shinji Nagashima; Norio Semba; Masami Akimoto; Yoshio Kimura; Naruaki Iida; Kouji Harada; Issei Ueda; Nobuo Konishi
Archive | 1989
Masami Akimoto; Yoshio Kimura; Osamu Hirakawa; Noriyuki Anai; Masanori Tateyama; Yasuhiro Sakamoto
Archive | 1994
Kiyohisa Tateyama; Masami Akimoto; Mitsuru Ushijima
Archive | 1990
Mitsuru Ushijima; Masami Akimoto
Archive | 1994
Masami Akimoto
Archive | 1990
Mitsuru Ushijima; Osamu Hirakawa; Masami Akimoto; Yoshio Kimura; Noriyuki Anai
Archive | 1995
Masami Akimoto; Kazutoshi Yoshioka; Naruaki Iida
