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Dive into the research topics where Masami Akimoto is active.

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Featured researches published by Masami Akimoto.


Robotics and Computer-integrated Manufacturing | 1993

Resist process system

Kiyohisa Tateyama; Masami Akimoto; Mitsuru Ushijima

A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.


Japanese Journal of Applied Physics | 2000

Performances of Novel Nozzle-Scan Coating Method

Shinichi Ito; Tatsuhiko Ema; Takahiro Kitano; Kohtaro Sho; Yukihiko Esaki; Masateru Morikawa; Kazuhiro Takeshita; Masami Akimoto; Katsuya Okumura

A novel nozzle-scan coating (NS-coating) method is useful for reducing the coated volume and its cost. We define the (waste-fluid rate) WFR as the ratio of the waste fluid to the fluid supplied on the wafer. In conventional spin-coating, the WFR is about 1500%. In the case of the extrusion-spin coating, the WFR decreases to 203%. But using the NS-coating with low speed and large acceleration, the WFR of the raw materials drastically decreased to 30%. This paper introduces some lithographic performances of NS-coating film of KrF chemical amplified resist that was coated with low WFR condition.


Archive | 2012

Film forming apparatus and film forming method

Takahiro Kitano; Masateru Morikawa; Masami Akimoto; Kazuhiro Takeshita


Archive | 2007

Substrate processing system

Keizo Hasebe; Shinji Nagashima; Norio Semba; Masami Akimoto; Yoshio Kimura; Naruaki Iida; Kouji Harada; Issei Ueda; Nobuo Konishi


Archive | 1989

Resist process apparatus

Masami Akimoto; Yoshio Kimura; Osamu Hirakawa; Noriyuki Anai; Masanori Tateyama; Yasuhiro Sakamoto


Archive | 1994

Resist processing method

Kiyohisa Tateyama; Masami Akimoto; Mitsuru Ushijima


Archive | 1990

Apparatus for coating a photo-resist film and/or developing it after being exposed

Mitsuru Ushijima; Masami Akimoto


Archive | 1994

Cleaning apparatus for cleaning reverse surface of semiconductor wafer

Masami Akimoto


Archive | 1990

COATING APPARATUS AND METHOD FOR APPLYING A LIQUID TO A SEMICONDUCTOR WAFER INCLUDING SELECTING A NOZZLE ON A STAND BY STATE

Mitsuru Ushijima; Osamu Hirakawa; Masami Akimoto; Yoshio Kimura; Noriyuki Anai


Archive | 1995

Method for processing wafer-shaped substrates

Masami Akimoto; Kazutoshi Yoshioka; Naruaki Iida

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