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Dive into the research topics where Joseph T. Hillman is active.

Publication


Featured researches published by Joseph T. Hillman.


Archive | 1997

Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions

Stanislaw Kopacz; Douglas Arthur Webb; Gerrit J. Leusink; Rene E. Leblanc; Michael S. Ameen; Joseph T. Hillman; Robert F. Foster; Robert C. Rowan


Archive | 1994

Method and apparatus for low temperature deposition of CVD and PECVD films

Robert F. Foster; Joseph T. Hillman; Rikhit Arora


Archive | 1997

Method and apparatus for preparing and metallizing high aspect ratio silicon semiconductor device contacts to reduce the resistivity thereof

Michael S. Ameen; Joseph T. Hillman


Archive | 1997

Use of TiCl4 etchback process during integrated CVD-Ti/TiN wafer processing

Michael S. Ameen; Gert J. Leusink; Joseph T. Hillman


Archive | 1999

Stacked showerhead assembly for delivering gases and RF power to a reaction chamber

Joseph T. Hillman


Archive | 2005

Phase change based heating element system and method

Ronald Thomas Bertram; Joseph T. Hillman; Maximilian A. Biberger


Archive | 1998

Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system

Glyn Reynolds; Joseph T. Hillman


Archive | 1999

Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a cvd chamber

Joseph T. Hillman; Tugrul Yasar; Kenichi Kubo; Vincent Vezin; Hideaki Yamasaki; Yasuhiko Kojima; Yumiko Kawano; Hideki Yoshikawa


Archive | 2004

System and method for processing a substrate using supercritical carbon dioxide processing

Glenn W. Gale; Joseph T. Hillman; Gunilla B. Jacobson; Bentley Palmer


Archive | 1995

Process for plasma enhanced anneal of titanium nitride

Robert F. Foster; Joseph T. Hillman; Rikhit Arora

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Michael S. Ameen

Materials Research Corporation

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