Wang David Nin-Kou | Researchain

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Featured researches published by Wang David Nin-Kou.

Archive | 1991

Two step process for forming an oxide layer over a stepped surface of a semiconductor wafer

Lee Peter Wai-Man; Wang David Nin-Kou; Makoto Nagashima; Kazuto Fukuma; Tatsuya E. Sato

Archive | 1990

Process and apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer

Wang David Nin-Kou; Lawrence C. Lei; Mei Chang; Cissy Leung

Archive | 1999

ENHANCED MAGNETIC FIELD PLASMA-ETCHING REACTOR

Cheng David; Maydan Dan; Somekh Sasson; Stalder Kenneth R; Andrews Dana L; Chang Mei; White John M; Wong Jerry Y K; Zeitlin Vladimir J; Wang David Nin-Kou

Archive | 1986

APPARATUS AND METHOD FOR MAGNETRON ENHANCED PLASMA AUXILIARYTYPE CHEMICAL VAPOR DEPOSITION

Foster Robert; Wang David Nin-Kou; Somekh Sasson; Maydan Dan

Archive | 1998

CVD METHOD FOR DEPOSITING TUNGSTEN LAYER ON SEMICONDUCTOR WAFER

Chang Mei; Leung Cissy; Wang David Nin-Kou; Cheng David

Archive | 1995

METHOD FOR MAKING FILM ADHERE FROM REACTIVE GAS PLASMA ON BASE WITH SMALL-SIZED AND HIGH DENSITY STEP SHAPE

Foster Robert; Wang David Nin-Kou; Somekh Sasson; Maydan Dan

Archive | 1987

Bromine-Ätzverfahren für Silizium

Wong Jerry Yuen Kui; Chang Mei; Maydan Dan; Wang David Nin-Kou; Mak Alfred W S

Archive | 1997

PLASMAÄTZVORRICHTUNG MIT MAGNETFELDVERSTÄRKUNG.

Cheng David; Maydan Dan; Somekh Sasson; Stalder Kenneth R; Andrews Dana L; Chang Mei; White John M; Wong Jerry Yuen Kui; Zeitlin Vladimir J; Wang David Nin-Kou

Archive | 1996