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Dive into the research topics where Mehdi Si Moussa is active.

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Featured researches published by Mehdi Si Moussa.


european microwave conference | 2007

Zero-temperature-coefficient biasing point of 2.4-GHz LNA in PD SOI CMOS technology

M. El Kaamouchi; Mehdi Si Moussa; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier

This paper reviews and analyzes a fully integrated low-noise amplifier (LNA) for low-power and high temperature applications, in 130 nm partially depleted silicon-on-insulator (SOI) CMOS technology. The LNA has been characterized over a temperature range from 25 to 200degC and designed using a cascode inductive source degeneration topology. Thanks to the SOI technology and the choice of the zero-temperature-coefficient (ZTC) bias point, the LNA measurements show a minor degradation of the gain due to the temperature variation for a power consumption of 2.3 mW under 1.2 V supply is applied. The effects of high temperature are observed on the gain of the LNA and on the SOI transistors in order to analyze the behavior of the LNA versus temperature effect.


international soi conference | 2007

High Temperature Antenna Switches in 130 nm SOI Technology

Mostafa Emam; M. El Kaamouchi; Mehdi Si Moussa; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier

This paper presents the design and the behavior vs. temperature of RF antenna switches in a 130 nm SOI technology. The design is implemented using two types of transistors; floating body and body tied transistors. It is shown that the floating body transistor is the best candidate for the design of RF antenna switches implemented in a fully integrated RF communication system. Outstanding high temperature behavior is also emphasized on a temperature range from 25degC to


european microwave conference | 2005

Behavior of a common source traveling wave amplifier versus temperature in SOI technology

Mehdi Si Moussa; C. Pavageau; Pascal Simon; F. Danneville; J. Russat; N. Fel; J.-P. Raskin; Danielle Vanhoenacker-Janvier

In this paper, the design and the results of a CMOS Silicon-On-Insulator (SOI) traveling wave amplifier (TWA) versus temperature are presented. The four stage TWA is designed with a single common source n-MOSFET in each stage using a 130 nm SOI CMOS technology requiring a chip area of 0.75 mm/sup 2/. A gain of 4.5 dB and a unity-gain bandwidth of 30 GHz are measured at 1.4 V supply voltage with a measured power consumption of 66 mW. The designed circuit has been characterized over a temperature range from 25 to 300/spl deg/C. The performance degradation on the gain of the TWA, the SOI transistors as well as the microstrip lines used for the matching network are analyzed.


international soi conference | 2006

DTMOS Low Noise Amplifier Design in Partially Depleted SOI CMOS Technology

Majid El Kaamouchi; Mehdi Si Moussa; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier

This paper reviews and analyzes a low-noise amplifier (LNA) for low-power applications using a cascode inductive source degeneration topology, with a dynamic threshold MOSFET (DTMOS) transistor in 130 nm CMOS SOI technology. Thanks to the introduction of dynamic threshold-voltage MOSFET (DTMOS), the measurement of the LNA shows 13 dB gain and -30 dB reflection input, while dissipating 6 mW under 1.2 V supply


Solid-state Electronics | 2008

Temperature behavior of spiral inductors on high resistivity substrate in SOI CMOS technology

Majid El Kaamouchi; Mehdi Si Moussa; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier


Third Workshop of the Thematic Network on Silicon on Insulator technology, devices and circuits – EuroSOI’07 | 2007

RF Antenna Switches Based on 130 nm Floating and Body-Tied SOI CMOS Technology

Mostafa Emam; Majid El Kaamouchi; Mehdi Si Moussa; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier


Third Workshop of the Thematic Network on Silicon on Insulator technology, devices and circuits – EuroSOI’07 | 2007

Design of a 23 GHz Low Noise Amplifier in 130 nm SOI CMOS Technology

Mehdi Si Moussa; C. Pavageau; L. Picheta; F. Danneville; J. Russat; N. Fel; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier


Archive | 2006

2006IEEEInternational SOIConference Proceedings DTMOS LowNoiseAmplifier Design inPartially Depleted SOICMOS Technology

M. El Kaamouchi; Mehdi Si Moussa; J. R. Raskin; Danielle Vanhoenacker-Janvier


Journées Nationales Micro-ondes – JNM’2005 | 2005

Amplificateur distribué en bande K avec technologie CMOS SOI 130 nm

C. Pavaganau; Mehdi Si Moussa; Alexandre Siligaris; L. Picheta; F. Danneville; Jean-Pierre Raskin; Danielle Vanhoenacker-Janvier


Union Radio-Scientifique Internationale (U.R.S.I.) | 2004

CMOS compatible 2-D self-assembled MEMS in thin film SOI technology

François Iker; Mehdi Si Moussa; Nicolas André; Thomas Pardoen; Jean-Pierre Raskin

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Jean-Pierre Raskin

Université catholique de Louvain

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M. El Kaamouchi

Université catholique de Louvain

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Majid El Kaamouchi

Université catholique de Louvain

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F. Danneville

Centre national de la recherche scientifique

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François Iker

Université catholique de Louvain

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Mostafa Emam

Université catholique de Louvain

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N. Fel

Université catholique de Louvain

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C. Pavageau

Centre national de la recherche scientifique

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L. Picheta

Centre national de la recherche scientifique

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