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Dive into the research topics where Michael D. Willwerth is active.

Publication


Featured researches published by Michael D. Willwerth.


Archive | 2004

Method and apparatus for stable plasma processing

Valentin N. Todorow; John Holland; Michael D. Willwerth


Archive | 2011

Apparatus for controlling the flow of a gas in a process chamber

David Palagashvili; Michael D. Willwerth; Jingbao Liu


Archive | 2007

Substrate processing with rapid temperature gradient control

Alexander Matyushkin; Dan Katz; John Holland; Theodoros Panagopoulos; Michael D. Willwerth


Archive | 2009

Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feed

Michael D. Willwerth; David Palagashvili; Brian K. Hatcher; Alexander Paterson; Douglas A. Buchberger


Archive | 2007

Method and apparatus for performing limited area spectral analysis

Matthew Fenton Davis; Lei Lian; Yasuhiro Uo; Michael D. Willwerth; Andrei Ivanovich Netchitaliouk


Archive | 2008

Methods for high temperature etching a high-k material gate structure

Wei Liu; Eiichi Matsusue; Meihua Shen; Shashank C. Deshmukh; Anh-Kiet Quang Phan; David Palagashvili; Michael D. Willwerth; Jong I. Shin; Barrett Finch; Yohei Kawase


Archive | 2007

Cathode liner with wafer edge gas injection in a plasma reactor chamber

Dan Katz; David Palagashvili; Michael D. Willwerth; Valentin N. Todorow; Alexander Paterson


Archive | 2012

Low sloped edge ring for plasma processing chamber

Changhun Lee; Michael D. Willwerth; Hoan Nguyen


Archive | 2008

Gas flow equalizer plate suitable for use in a substrate process chamber

Ajit Balakrishna; Shahid Rauf; Andrew Nguyen; Michael D. Willwerth; Valentin N. Todorow


Archive | 2007

High ac current high rf power ac-rf decoupling filter for plasma reactor heated electrostatic chuck

Valentin N. Todorov; Michael D. Willwerth; Alexander Paterson; Brian K. Hatcher; James E. Sammons; John Holland

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