David Palagashvili | Researchain

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Featured researches published by David Palagashvili.

Archive | 2008

Plasma process employing multiple zone gas distribution for improved uniformity of critical dimension bias

Dan Katz; David Palagashvili; Brian K. Hatcher; Theodoros Panagopoulos; Valentin N. Todorow; Edward P. Hammond; Alexander Paterson; Rodolfo P. Belen

Archive | 2011

Apparatus for controlling the flow of a gas in a process chamber

David Palagashvili; Michael D. Willwerth; Jingbao Liu

Archive | 2002

Tandem etch chamber plasma processing system

Alexander Paterson; Valentin N. Todorov; Jon M. Mcchesney; Gerhard Schneider; David Palagashvili; John Holland; Michael Barnes

Archive | 2009

Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feed

Michael D. Willwerth; David Palagashvili; Brian K. Hatcher; Alexander Paterson; Douglas A. Buchberger

Archive | 2001

Plasma reactor electrode

Michael Barnes; David Palagashvili

Archive | 2000

Gas distribution plate

Harald Herchen; David Palagashvili; Dmitry Lubomirsky; Alex Schreiber

Archive | 2008

PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVED UNIFORMITY OF CRITICAL DIMENSION BIAS

Dan Katz; David Palagashvili; Brain K. Hatcher; Theodoros Panagopoulos; Valentin N. Todorow; Edward P. Hammond; Alexander Paterson; Rodolfo P. Belen

Archive | 2007

Reactor for wafer backside polymer removal using plasma products in a lower process zone and purge gases in an upper process zone

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorow; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Archive | 2011

COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DUTY CYCLE CONTROL

Chetan Mahadeswaraswamy; Kartik Ramaswamy; Bryan Liao; Sergio Fukuda Shoji; Duy D. Nguyen; Hamid Noorbakhsh; David Palagashvili

Archive | 2008

Methods for high temperature etching a high-k material gate structure

Wei Liu; Eiichi Matsusue; Meihua Shen; Shashank C. Deshmukh; Anh-Kiet Quang Phan; David Palagashvili; Michael D. Willwerth; Jong I. Shin; Barrett Finch; Yohei Kawase

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