Is this you? Create Your Porfile
Avatar

Mikhaïl Baklanov

Tokyo Electron

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Mikhaïl Baklanov is active.

Explore More

Publication

Featured researches published by Mikhaïl Baklanov.

Advanced Interconnects for ULSI Technology | 2012

3. Plasma Processing of Low-k Dielectrics

Hualiang Shi; Denis Shamiryan; Jean-Francois de Marneffe; Huai Huang; Paul S. Ho; Mikhaïl Baklanov

Archive | 2012

Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasma

Jean-Francois de Marneffe; Rami Ljazouli; Laurent Souriau; Liping Zhang; Hsiang-Yun Lee; Christopher J. Wilson; Mikhaïl Baklanov

Archive | 2012

Etch challenges of a spin-on trilayer resist system for narrow pitch dual damascene patterning

Frederic Lazzarino; Christopher J. Wilson; Vincent Truffert; Bart Vereecke; Steven Demuynck; Jean-Francois de Marneffe; Mikhaïl Baklanov

Archive | 2016

Method of etching porous film

Shigeru Tahara; Eiichi Nishimura; Mikhaïl Baklanov; Liping Zhang; Jean-Francois de Marneffe

Archive | 2016

Integration aspects of post-porosity low-k protection using PMMA sacrificial filler

Liping Zhang; Jean-Francois de Marneffe; Liang Gong Wen; Christopher J. Wilson; Zsolt Tokei; Juergen Boemmels; Stefan De Gendt; Mikhaïl Baklanov

Archive | 2016

Impact of PVD barrier deposition sequence on ultra low-k dielectrics

Mikhail Krishtab; Thomas Witters; Stefan De Gendt; Mikhaïl Baklanov

Archive | 2016

Low dielectric constant materials for nanoelectronics

Mikhaïl Baklanov; Kris Vanstreels; Chen Wu; Yunlong Li; Kristof Croes

Plasma Etch and Strip in Microtecnology | 2015

A novel low temperature etch approach to reduce ULK plasma damage

Liping Zhang; Jean-Francois de Marneffe; Floriane Leroy; Rami Ljazouli; Philippe Lefaucheux; Thomas Tillocher; Remi Dussart; Kaoru Maekawa; Koichi Yatsuda; Christian Dussarat; Stefan De Gendt; Mikhaïl Baklanov

Plasma Etch and Strip in Microtechnology | 2015

Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis

Floriane Leroy; Thomas Tillocher; Liping Zhang; A. Girard; Christophe Cardinaud; Philippe Lefaucheux; Jean-Francois de Marneffe; Remi Dussart; Kaoru Maekawa; Koichi Yatsuda; Mikhaïl Baklanov

Archive | 2015

Advanced ultralow-k organosilicate glasses: NEXAFS study

A. S. Konashuk; E. O. Filatova; Valeri Afanasiev; Mikhail Krishtab; M. Redzheb; Mikhaïl Baklanov

Explore More

Collaboration

Dive into the Mikhaïl Baklanov's collaboration.

Top Co-Authors
Avatar

Jean-Francois de Marneffe

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Liping Zhang

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Mikhail Krishtab

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Stefan De Gendt

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Thomas Tillocher

University of Orléans

View shared research outputs
Top Co-Authors
Avatar

Remi Dussart

Centre national de la recherche scientifique

View shared research outputs
Top Co-Authors
Avatar

Christopher J. Wilson

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Zsolt Tokei

Katholieke Universiteit Leuven

View shared research outputs
Top Co-Authors
Avatar

Philippe Lefaucheux

Centre national de la recherche scientifique

View shared research outputs
Top Co-Authors
Avatar

Markus Heyne

Katholieke Universiteit Leuven

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge