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The Japan Society of Applied Physics | 1994

Metal Removal from a Silicon Surface by UV Irradiation in Pure Water

Mokuji Kageyama; Moriya Miyashita; Hiroyasu Kubota

A new wet cleaning method using pure water and ultraviolet light has been investigated. This method, the PWruV cleaning, is simply irradiating a pure water coated silicon wafer with ultraviolet light. The metal removal efficiency was evaluated for transition metals adsorbed on hydrophilic surface and copper deposited on hydrophobic surface. It was found that the PWUV cleaning has high efficiency for metal removal without any reactive chemicals and gases


Archive | 1989

Impurity measuring method

Ayako Maeda; Mokuji Kageyama; Shintaro Yoshii; Masanobu Ogino


Archive | 1992

Method and apparatus for detecting defect on semiconductor substrate surface

Moriya Miyashita; Mokuji Kageyama; Hachiro Hiratsuka


Archive | 1993

Semiconductor treatment apparatus

Mokuji Kageyama; Kiyoshi Yoshikawa; Ayako Shimazaki


Archive | 1995

Method of manufacturing semiconductor device and methods of processing, analyzing and manufacturing its substrate

Mokuji Kageyama; Moriya Miyashita


Archive | 1991

SYSTEM FOR ANALYZING METAL IMPURITY ON THE SURFACE OF A SINGLE CRYSTAL SEMICONDUCTOR BY USING TOTAL REFLECTION OF X-RAYS FLUORESCENCE

Atsuko Kubota; Norihiko Tsuchiya; Shuichi Samata; Yoshiaki Matsushita; Mokuji Kageyama


Archive | 1999

Etching method, etching apparatus and analyzing method

Shoko Ito; Mokuji Kageyama


Archive | 1996

APPARATUS AND METHOD FOR EVALUATING SEMICONDUCTOR SUBSTRATE

Mokuji Kageyama; Atsuko Kubota; Hiroshi Matsushita; Norihiko Tsuchiya


Archive | 1989

Method of measuring impurities in oxide films using a meltable sample collection stick

Mokuji Kageyama; Ayako Maeda


The Japan Society of Applied Physics | 1990

Nondestructive Evaluation of Trace Metals and Application to Defect Generation

N. Tsuchiya; M. Tanaka; Mokuji Kageyama; Atsuko Kubota; Yoshiaki Matsushita

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