Nam-Gun Kim

METHODS FOR PATTERNING MICROELECTRONIC DEVICES USING TWO SACRIFICIAL LAYERS

SEMICONDUCTOR DEVICES INCLUDING AIR GAP SPACERS AND METHODS OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICES INCLUDING BIT LINE CONTACT PLUG AND BURIED CHANNEL ARRAY TRANSISTOR, METHODS OF FABRICATING THE SAME, AND SEMICONDUCTOR MODULES, ELECTRONIC CIRCUIT BOARDS AND ELECTRONIC SYSTEMS INCLUDING THE SAME

Method of etching carbon-containing layer, method of forming contact hole using the same, and method of manufacturing semiconductor device using the same

METHOD OF FORMING SEMICONDUCTOR DEVICE HAVING CONTACT PLUG

Methods for forming a semiconductor device including fine patterns

Semiconductor devices including air gap spacers

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES INCLUDING AIR GAP SPACERS

SEMICONDUCTOR DEVICES INCLUDING SPACERS

Semiconductor devices including bit line contact plug and buried channel array transistor, and semiconductor modules, electronic circuit boards and electronic systems including the same