Nanseng Jeng

Thermal trench isolation

Method of semiconductor device isolation employing polysilicon layer for field oxide formation

Process for doping hemispherical grain silicon

Method of trench isolation during the formation of a semiconductor device

Low-stress method of fabricating field-effect transistors having silicon nitride spacers on gate electrode edges

Method of reducing stress-induced defects in silicon

Semiconductor processing methods of forming field oxidation regions on a semiconductor substrate

Process to improve the flow of oxide during field oxidation by fluorine doping

Field oxide formation by oxidation of polysilicon layer

Streamlined field isolation process