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Noelscher Christoph

Infineon Technologies

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Publication

Featured researches published by Noelscher Christoph.

Archive | 2002

Verfahren zum Feststellen und Beheben von Phasenkonflikten auf alternierenden Phasenmasken und Maskendesign zur Verwendung bei einem solchen Verfahren

Moukara Molela; Ludwig Burkhard; Heismeier Michael; Hofsaes Markus; Noelscher Christoph

Archive | 2003

Method for structuring photoresists e.g. for manufacture of semiconductors, involves double exposure with imaging auxiliary structures and different exposure devices

Noelscher Christoph; Semmler Armin; Czech Guenther

Archive | 2004

Verfahren zur Bildung eines Strukturelementes auf einem Wafer mittels einer Maske und einer ihr zugeordneten Trim-Maske

Noelscher Christoph

Archive | 2002

Manufacturing method for integrated circuit photomask e.g. for microlithography, requires non-imaging transmission zone of first transmission type for reducing space between projection image of first- and second-mask zones

Noelscher Christoph

Archive | 2013

LITHOGRAPHIC MASK AND METHOD OF MANUFACTURING LITHOGRAPHIC MASK

Rolff Haiko; Byloos Carla; Noelscher Christoph; Morgana Nicolo; Koehle Roderick; Moukara Molela; Neubauer Ralf; Pforr Rainer; Savignac Dominique

Archive | 2010

LITHOGRAPHY MASK, AND MANUFACTURING METHOD OF LITHOGRAPHY MASK

Rolff Haiko; Byloos Carla; Noelscher Christoph; Morgana Nicolo; Koehle Roderick; Moukara Molela; Neubauer Ralf; Pforr Rainer; Savignac Dominique

Archive | 2007

Mask e.g. hybrid mask, for lithographic projection on e.g. semiconductor wafer, for producing integrated circuit, has structures, each with two distances to structure units, such that structures are asymmetrically arranged in interspaces

Noelscher Christoph

Archive | 2007

Simulation method for simulation of optical projection of sample in photosensitive resist, involves alleging of record and absorption coefficient for execution of optical projection and weakening of intensities respectively

Noelscher Christoph; Henkel Thomas

Archive | 2007

Fotoempfindliche Beschichtung zum Verstärken eines Kontrasts einer fotolithographischen Belichtung

Elian Klaus; Noelscher Christoph

Archive | 2006

Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske

Noelscher Christoph

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Pforr Rainer

Infineon Technologies

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Hennig Mario

Infineon Technologies

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Elian Klaus

Infineon Technologies

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Koehle Roderick

Infineon Technologies

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Moukara Molela

Infineon Technologies

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Henkel Thomas

Infineon Technologies

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Kieslich Albrecht

Infineon Technologies

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Czech Guenther

Infineon Technologies

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Heckmann Nicole

Infineon Technologies

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Heismeier Michael

Infineon Technologies

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