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Hennig Mario

Infineon Technologies

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Publication

Featured researches published by Hennig Mario.

Archive | 2006

STRUCTURE FOR PROJECTING PATTERN ON IMAGE SURFACE

Moukara Molela; Pforr Rainer; Muelders Thomas; Hennig Mario; Zeiler Karsten

Archive | 2006

ARRANGEMENT FOR PROJECTING A PATTERN INTO AN IMAGE PLANE

Moukara Molela; Pforr Rainer; Muelders Thomas; Hennig Mario; Zeiler Karsten

Archive | 2007

Verfahren zur Herstellung einer Phasenschiebermaske und Verfahren zur Belichtung eines Halbleiterwafers mit solch einer Phasenschiebermaske

Hennig Mario; Koehle Roderick; Kunkel Gerhard; Pforr Rainer; Voigt Ina

Archive | 2006

Reducing critical dimension variations caused by scattered light in functional structures formed by photolithographic imaging comprises using two masks, one with a reduced bright-field content

Noelscher Christoph; Pforr Rainer; Kamm Frank-Michael; Ziebold Ralf; Hennig Mario

Archive | 2006

Tri-tone mask for lithographic manufacturing of semiconductor device, has mask structure in chromium layer, halftone layer or glass layer, where structure is surrounded by strip of halftone layer with predetermined width

Moukara Molela; Winkler Thorsten; Zeiler Karsten; Koehle Roderick; Thiele Joerg; Dettmann Wolfgang; Mittermeier Armelle Benedicte; Hennig Mario; Koestler Wolfram

Archive | 2006

Mask transformation system for manufacturing of semiconductor circuit, has connection mask structure transversely aligned in sections to dipole axis and formed on mask, where structure connects main mask structures with each other

Moukara Molela; Winkler Thorsten; Zeiler Karsten; Thiele Joerg; Koestler Wolfram; Hennig Mario

Archive | 2005

METHOD FOR TRANSFERRING A CRITICAL LAYOUT OF A LEVEL OF AN INTEGRATED CIRCUIT TO A SEMICONDUCTOR SUBSTRATE

Noelscher Christoph; Pforr Rainer; Hennig Mario; Kieslich Albrecht

Archive | 2005

Photolithographic photomask production involves coating the photolacquer with an acid at a stage between the solvent removal and the final development step

Voelkel Lars; Pforr Rainer; Laessig Antje; Elian Klaus; Hennig Mario; Noelscher Christoph; Koestler Wolfram

Archive | 2005

Verfahren zur Übertragung eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat

Noelscher Christoph; Kieslich Albrecht; Pforr Rainer; Hennig Mario

Archive | 2004

Method of manufacturing a phase shifting mask and wafer exposure method using such a phase shifting mask

Hennig Mario; Koehle Roderick; Kunkel Gerhard; Pforr Rainer; Voigt Ina

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Collaboration

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Pforr Rainer

Infineon Technologies

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Koehle Roderick

Infineon Technologies

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Zeiler Karsten

Infineon Technologies

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Kunkel Gerhard

Infineon Technologies

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Moukara Molela

Infineon Technologies

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Noelscher Christoph

Infineon Technologies

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Voigt Ina

Infineon Technologies

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Dettmann Wolfgang

Infineon Technologies

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Koestler Wolfram

Infineon Technologies

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Thiele Joerg

Infineon Technologies

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