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Norbert Mühlberger

Carl Zeiss AG

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Publication

Featured researches published by Norbert Mühlberger.

Archive | 2012

Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage

Michael Erath; Florian Bach; Ulrich Schönhoff; Rodolfo Rabe; Norbert Mühlberger; Dirk Eicher; Jasper Wesselingh

Archive | 2009

Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen

Jürgen Fischer; Norbert Mühlberger; Matthias Orth; Thorsten Rassel; Armin Schöppach

Archive | 2010

Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik

Armin Werber; Norbert Mühlberger; Florian Bach

Archive | 2009

Gravitation compensation for optical elements in projection lighting systems

Norbert Mühlberger; Thorsten Rassel; Armin Schöppach; Jürgen Fischer; Matthias Orth

Archive | 2010

Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen

Jürgen Fischer; Armin Schöppach; Matthias Orth; Norbert Mühlberger; Thorsten Rassel

Archive | 2008

Arrangement, particularly for microlithography, has component of optical device, and manipulation element that is formed to produce counter force against operating force by elastic restoring force

Gerhard Beurer; Norbert Mühlberger; Peter Nowak; Thorsten Rassel

Archive | 2009

Projection exposure system for use in microlithography for production of semiconductor components, has optical element statically deformable by force effect, where electrostatic force field acts between subelements of optical element

Jürgen Fischer; Norbert Mühlberger; Jürgen Huber

Archive | 2011

Arrangement for holding an optical element, in particular in an EUV projection exposure system

Florian Bach; Dirk Eicher; Michael Erath; Norbert Mühlberger; Rodolfo Rabe; Ulrich Schönhoff; Jasper Wesselingh

Archive | 2010

Einzelspiegel zum aufbau eines facettenspiegels, insbesondere zum einsatz in einer projektionsbelichtungsanlage für die mikro-lithographie

Armin Werber; Norbert Mühlberger; Florian Bach

Archive | 2010

Miroir élémentaire destiné à constituer un miroir à facettes, en particulier à utiliser dans une installation d'éclairage par projection destinée à la micro-lithographie

Armin Werber; Norbert Mühlberger; Florian Bach

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Collaboration

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Florian Bach

Carl Zeiss AG

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Jürgen Fischer

Carl Zeiss AG

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Thorsten Rassel

Carl Zeiss AG

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Armin Werber

Carl Zeiss AG

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Armin Schöppach

Carl Zeiss AG

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Matthias Orth

Carl Zeiss AG

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Dirk Eicher

Carl Zeiss AG

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Jasper Wesselingh

Carl Zeiss AG

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Michael Erath

Carl Zeiss AG

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Rodolfo Rabe

Carl Zeiss AG

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