Is this you? Create Your Porfile
Avatar

Thorsten Rassel

Carl Zeiss AG

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Thorsten Rassel is active.

Explore More

Publication

Featured researches published by Thorsten Rassel.

Archive | 2002

Imaging device in a projection exposure facility

Wolfgang Hummel; Juergen Fischer; Karl-Eugen Aubele; Erich Merz; Raoul Reiner; Klaus Rief; Stefan Schoengart; Markus Neumaier; Baerbel Trossbach; Ulrich Weber; Michael Muehlbeyer; Hubert Holderer; Alexander Kohl; Jochen Weber; Johannes Lippert; Thorsten Rassel

Archive | 2009

Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen

Jürgen Fischer; Norbert Mühlberger; Matthias Orth; Thorsten Rassel; Armin Schöppach

Archive | 2007

Imaging device in a projection exposure machine

Wolfgang Hummel; Jürgen Fischer; Karl-Eugen Aubele; Erich Merz; Raoul Reiner; Klaus Rief; Stefan Schöngart; Markus Neumaier; Bärbel Trossbach; Ulrich Weber; Michael Mühlbeyer; Hubert Holderer; Alexander Kohl; Jochen Weber; Johannes Lippert; Thorsten Rassel

Archive | 2011

Gravitation compensation for optical elements in projection exposure apparatuses

Norbert Muehlberger; Thorsten Rassel; Armin Schoeppach; Juergen Fischer; Matthias Orth

Archive | 2006

Optical imaging device

Thorsten Rassel; Erich Merz; Martin Mahlmann

Archive | 2009

Gravitation compensation for optical elements in projection lighting systems

Norbert Mühlberger; Thorsten Rassel; Armin Schöppach; Jürgen Fischer; Matthias Orth

Archive | 2011

Projection exposure apparatus for microlithography for the production of semiconductor components

Juergen Fischer; Armin Schoeppach; Matthias Orth; Norbert Muehlberger; Thorsten Rassel; Armin Werber; Juergen Huber

Archive | 2010

Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen

Jürgen Fischer; Armin Schöppach; Matthias Orth; Norbert Mühlberger; Thorsten Rassel

Archive | 2008

Optical device e.g. illumination system, operating method for use in projection exposure system, involves storing element such that no parasitic adjustments or changes of element develop during or after rotation in imaging characteristics

Jürgen Fischer; Bernhard Gellrich; Andreas Heisler; Erich Merz; Thorsten Rassel; Andreas Schubert; Erich Schubert; Franz Sorg; Jochen Weber

Archive | 2015

MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Thorsten Rassel; Markus Hauf

Explore More

Collaboration

Dive into the Thorsten Rassel's collaboration.

Top Co-Authors
Avatar

Erich Merz

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Jochen Weber

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Jürgen Fischer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Juergen Fischer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Karl-Eugen Aubele

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Alexander Kohl

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Hubert Holderer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Johannes Lippert

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Klaus Rief

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Markus Neumaier

Carl Zeiss AG

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge