Armin Schöppach

Objective comprising at least one optical element

Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen

Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner

Projection lens for micro lithography, has multiple lenses with local optical axis, where one lens is assigned to manipulator with actuators, and input force or input torque is attained by former actuators

Mirror`s imaging characteristics variation device for projection exposure system, has actuators formed such that changeable forces are introduced in mirror by variation in temperature, where forces lead to deformation of mirror surface

Gravitation compensation for optical elements in projection lighting systems

Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen

Projection exposure system for manufacturing semiconductor component i.e. computer chip, has changing unit for changing optical assembly that is exchangeably formed, and bearing unit reducing deformations of optical element caused by holder

Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung

Method for connecting an optical element with a fitting on at least one connecting site used in semiconductor lithography comprises indirectly or directly positioning the element and the fitting during connection using a support element