Olaf Storbeck

Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object

Method for improved dielectric performance

Method for fabricating an integrated circuit with a CMOS manufacturing process

Process for forming nitride-oxide dielectric layers

Memory and method for fabricating it

Method for minimizing tungsten oxide evaporation during selective sidewall oxidation of tungsten-silicon gates

Contaminants concentration determination system, used in oven for processing wafers, controls movement of probe to desired position loading/unloading chamber within which gas sample is stored

Method for roughening a surface of a semioconductor substrate

Arrangement and method for cleaning a semiconductor device

Arrangement for supporting disklike objects in a processing system