Oscar Vazquez-Mena

Metallic Nanowires by Full Wafer Stencil Lithography

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for Al and 5 microOmegacm for Au and maximum current density of approximately 10(8) A/cm(2). This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.

Metallic Nanodot Arrays by Stencil Lithography for Plasmonic Biosensing Applications

The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50-200 nm wide nanodots with different spacing of 50-300 nm are fabricated without any resist, etching, or lift-off process. The dimensions and morphology of the nanodots were characterized by scanning electron and atomic force microscopy. The fabricated nanodots showed localized surface plasmon resonance in their extinction spectra in the visible range. The resonance wavelength depends on the periodicity and dimensions of the nanodots. Bulk refractive index measurements and model biosensing of streptavidin were successfully performed based on the plasmon resonance shift induced by local refractive index change when biomolecules are adsorbed on the nanodots. These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices.

Facile fabrication of nanofluidic diode membranes using anodic aluminium oxide

Active control of ion transport plays important roles in chemical and biological analytical processes. Nanofluidic systems hold the promise for such control through electrostatic interaction between ions and channel surfaces. Most existing experiments rely on planar geometry where the nanochannels are generally very long and shallow with large aspect ratios. Based on this configuration the concepts of nanofluidic gating and rectification have been successfully demonstrated. However, device minimization and throughput scaling remain significant challenges. We report here an innovative and facile realization of hetero-structured Al(2)O(3)/SiO(2) (Si) nanopore array membranes by using pattern transfer of self-organized nanopore structures of anodic aluminum oxide (AAO). Thanks to the opposite surface charge states of Al(2)O(3) (positive) and SiO(2) (negative), the membrane exhibits clear rectification of ion current in electrolyte solutions with very low aspect ratios compared to previous approaches. Our hetero-structured nanopore arrays provide a valuable platform for high throughput applications such as molecular separation, chemical processors and energy conversion.

High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks

The development of nanoscale lithographic methods on polymer materials is a key requirement to improve the spatial resolution and performance of flexible devices. Here, we report the fabrication of metallic nanostructures down to 20 and 50 nm in size on polymer materials such as polyimide, parylene, SU-8, and PDMS substrates without any resist processing using stencil lithography. Metallic nanodot array analysis of their localized surface plasmon spectra is included. We demonstrate plasmon resonance detection of biotin and streptavidin using a PDMS flexible film with gold nanodots. We also demonstrate the fabrication of metallic nanowires on polyimide substrates with their electrical characteristics showing an ohmic behavior. These results demonstrate high-resolution nanopatterning and device nanofabrication capability of stencil lithography on polymer and flexible substrates.

Analysis of the blurring in stencil lithography.

A quantitative analysis of blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structure directly deposited on the substrate is larger than the stencil aperture due to geometrical factors, and second, a halo of material is formed surrounding the deposited structure, presumably due to surface diffusion. The blurring is studied as a function of the gap using dedicated stencils that allow a controlled variation of the gap. Our results show a linear relationship between the gap and the blurring of the directly deposited structure. In our configuration, with a material source of approximately 5 mm and a source-substrate distance of 1 m, we find that a gap size of approximately 10 microm enlarges the directly deposited structures by approximately 50 nm. The measured halo varies from 0.2 to 3 microm in width depending on the gap, the stencil aperture size and other deposition parameters. We also show that the blurring can be reduced by decreasing the nominal deposition thickness, the deposition rate and the substrate temperature.

Screening-Engineered Field-Effect Solar Cells

Photovoltaics (PV) are a promising source of clean renewable energy, but current technologies face a cost-to-efficiency trade-off that has slowed widespread implementation. We have developed a PV architecture-screening-engineered field-effect photovoltaics (SFPV)-that in principle enables fabrication of low-cost, high efficiency PV from virtually any semiconductor, including the promising but hard-to-dope metal oxides, sulfides, and phosphides. Prototype SFPV devices have been constructed and are found to operate successfully in accord with model predictions.

Performance enhancement of a graphene-zinc phosphide solar cell using the electric field-effect.

The optical transparency and high electron mobility of graphene make it an attractive material for photovoltaics. We present a field-effect solar cell using graphene to form a tunable junction barrier with an Earth-abundant and low cost zinc phosphide (Zn3P2) thin-film light absorber. Adding a semitransparent top electrostatic gate allows for tuning of the graphene Fermi level and hence the energy barrier at the graphene-Zn3P2 junction, going from an ohmic contact at negative gate voltages to a rectifying barrier at positive gate voltages. We perform current and capacitance measurements at different gate voltages in order to demonstrate the control of the energy barrier and depletion width in the zinc phosphide. Our photovoltaic measurements show that the efficiency conversion is increased 2-fold when we increase the gate voltage and the junction barrier to maximize the photovoltaic response. At an optimal gate voltage of +2 V, we obtain an open-circuit voltage of V oc = 0.53 V and an efficiency of 1.9% under AM 1.5 1-sun solar illumination. This work demonstrates that the field effect can be used to modulate and optimize the response of photovoltaic devices incorporating graphene.

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring, and Clogging Corrections

The reliable and reproducible fabrication of nanostructures by stencil lithography (SL) faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures in the stencil membranes. This study reports on these three important issues and presents corresponding solutions for the patterning of nanostructures by SL. To increase the stiffness and the stability of the membranes, we have used a hexagonal array of corrugations to globally reinforce the stencil membranes. To correct the blurring, we have used a corrective etching that improves the definition of Al nanostructures. Using this corrective etching, we have fabricated poly-Si nanowires. Finally, we have used metal wet etching to remove the material accumulated on the membranes as a remedy to the clogging.

Stenciled conducting bismuth nanowiresa)

Stencil lithography is used here for the fabrication of bismuth nanowires using thermal evaporation. This technique provides good electrical contact resistance by having the nanowire structure and the contact pads deposited at the same time. It has also the advantage of modulating nanowires’ height as a function of their width. As the evaporated material deposits on the stencil mask, the apertures shrink in size until they are fully clogged and no more material can pass through. Thus, the authors obtain variable-height (from 27 to 95 nm) nanowires in the same evaporation. Upon their morphological (scanning electron microscopy and atomic force microscopy) and electrical characterizations, the authors obtain their resistivity, which is independent of the nanowire size and is the lowest reported for physical vapor deposition of Bi nanowires (1.2×10−3 Ω cm), only an order of magnitude higher than that of bulk bismuth.

Metal insulator semiconductor solar cell devices based on a Cu2O substrate utilizing h-BN as an insulating and passivating layer

We demonstrate cuprous oxide (Cu2O) based metal insulator semiconductor Schottky (MIS-Schottky) solar cells with efficiency exceeding 3%. A unique direct growth technique is employed in the fabrication, and hexagonal boron nitride (h-BN) serves simultaneously as a passivation and insulation layer on the active Cu2O layer. The devices are the most efficient of any Cu2O based MIS-Schottky solar cells reported to date.