Päivi Mattila

Enhanced light extraction from InGaN/GaN quantum wells with silver gratings

We demonstrate that an extraction enhancement by a factor of 2.8 can be obtained for a GaN quantum well structure using metallic nanostructures, compared to a flat semiconductor. The InGaN/GaN quantum well is inserted into a dielectric waveguide, naturally formed in the structure, and a silver grating is deposited on the surface and covered with a polymer film. The polymer layer greatly improves the extraction compared to a single metallic grating. The comparison of the experiments with simulations gives strong indications on the key role of weakly guided modes in the polymer layer diffracted by the grating.

The Green’s Function Description of Emission Enhancement in Grated LED Structures

Using scattering to improve light extraction from semiconductors is a widely adopted method to increase the efficiency of modern light-emitting devices. Recently, there has also been much interest in the potential emission enhancement provided by the strong coupling between surface plasmons and semiconductor emitters. In this study, we develop a Greens function-based model to describe the emission enhancement and modification in optical properties obtained as a result of scattering and plasmon engineering. The Greens function method is used to answer fundamental questions regarding luminescence enhancement in periodically grated GaN light-emitting structures. The Greens function approach is a very attractive analytical method to studying the emission properties of grated multilayer structures, providing insight beyond numerical solutions. Modeling results from reflectometry measurements of silver-grated GaN structures allows to explain experimentally observed interference features. A discussion regarding the role of periodic grating in enhancing emission from the structures is included.

High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning

This paper examines the utilization of plasma-enhanced atomic layer deposition grown AlN in the fabrication of a high-k insulator layer on GaAs. It is shown that high-k GaAs MIS capacitors with an unpinned Fermi level can be fabricated utilizing a thin ex-situ deposited AlN passivation layer. The illumination and temperature induced changes in the inversion side capacitance, and the maximum band bending of 1.2 eV indicates that the MIS capacitor reaches inversion. Removal of surface oxide is not required in contrast to many common ex-situ approaches.

Low energy electron beam induced damage on InGaN/GaN quantum well structure

In this paper, low energy electron beam (5–20 keV, 0–500 μAs/cm2) induced damage on a GaN/InGaN/GaN near-surface quantum well structure is studied. Exposure to low energy electron beam is shown to significantly reduce the optical quality of the structure. It is also observed that reducing the electron beam energy causes larger PL intensity reduction. This can be explained by considering the beam penetration depth, which is shown to be smaller with lower e-beam energies. The damage is believed to be attributed to enhanced dislocation mobility upon low energy electron beam irradiation. However, further studies are needed to confirm the mechanism. These results should be taken into consideration in low energy electron beam related sample characterization and preparation.

Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition

Surface passivation of GaAs by ammonia plasma and AlN fabricated by plasma-enhanced atomic layer deposition are compared. It is shown that the deposition temperature can be reduced to 150 °C and effective passivation is still achieved. Samples passivated by AlN fabricated at 150 °C show four times higher photoluminescence intensity and longer time-resolved photoluminescence lifetime than ammonia plasma passivated samples. The passivation effect is shown to last for months. The dependence of charge carrier lifetime and integrated photoluminescence intensity on AlN layer thickness is studied using an exponential model to describe the tunneling probability from the near-surface quantum well to the GaAs surface.