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Featured researches published by Pan-Suk Kwak.


IEEE Journal of Solid-state Circuits | 2012

A 21 nm High Performance 64 Gb MLC NAND Flash Memory With 400 MB/s Asynchronous Toggle DDR Interface

Chulbum Kim; Jinho Ryu; Taesung Lee; Hyung-Gon Kim; Jaewoo Lim; Jaeyong Jeong; Seonghwan Seo; Hong-Soo Jeon; Bo-Keun Kim; Inyoul Lee; Dooseop Lee; Pan-Suk Kwak; Seong-Soon Cho; Yong-Sik Yim; Chang-hyun Cho; Woopyo Jeong; Kwang-Il Park; Jinman Han; Du-Heon Song; Kye-Hyun Kyung; Young-Ho Lim; Young-Hyun Jun

A monolithic 64 Gb MLC NAND flash based on 21 nm process technology has been developed. The device consists of 4-plane arrays and provides page size of up to 32 KB. It also features a newly developed asynchronous DDR interface that can support up to the maximum bandwidth of 400 MB/s. To improve performance and reliability, on-chip randomizer, soft data readout, and incremental bit line pre-charge scheme have been developed.


international solid-state circuits conference | 2016

7.1 256Gb 3b/cell V-NAND flash memory with 48 stacked WL layers

Dongku Kang; Woopyo Jeong; Chulbum Kim; Doohyun Kim; Yong Sung Cho; Kyung-Tae Kang; Jinho Ryu; Kyung-Min Kang; Sung-Yeon Lee; Wandong Kim; Hanjun Lee; Jaedoeg Yu; Nayoung Choi; Dong-Su Jang; Jeong-Don Ihm; Doo-gon Kim; Young-Sun Min; Moosung Kim; An-Soo Park; Jae-Ick Son; In-Mo Kim; Pan-Suk Kwak; Bong-Kil Jung; Doo-Sub Lee; Hyung-Gon Kim; Hyang-ja Yang; Dae-Seok Byeon; Kitae Park; Kye-Hyun Kyung; Jeong-Hyuk Choi

Todays explosive demand for data transfer is accelerating the development of non-volatile memory with even larger capacity and cheaper cost. Since the introduction of 3D technology in 2014 [1], V-NAND is believed to be a successful alternative to planar NAND and is quickly displacing planar NAND in the SSD market, due to its performance, reliability, and cost competitiveness. V-NAND has also eliminated the cell-to-cell interference problem by forming an atomic layer for charge trapping [2], which enables further technology scaling. However, the etching technology required for creating a channel hole cannot keep up with the market-driven WL stack requirement. Therefore, total mold height reduction is unavoidable and this creates several problems. 1) reduced mold height increases resistance and capacitance for WLs due to the thinner layers being used. 2) channel hole critical dimension (CD) variation becomes problematic because the additional mold stack height aggravates uniformity, thereby producing WL resistance variation. Consequently, read and program performance degradation is inevitable, furthermore their optimization becomes more challenging.


international solid-state circuits conference | 2005

An 8 Gb multi-level NAND flash memory with 63 nm STI CMOS process technology

Dae-Seok Byeon; Sung-Soo Lee; Young-Ho Lim; Jin-Sung Park; Wook-Kee Han; Pan-Suk Kwak; Dong-Hwan Kim; Dong-Hyuk Chae; Seung-Hyun Moon; Seung-Jae Lee; Hyunchul Cho; Jung-Woo Lee; Moosung Kim; Joon-Sung Yang; Youngwoo Park; D.I. Bae; Jung-Dal Choi; Sung-Hoi Hur; Kang-Deog Suh

An 8 Gb multi-level NAND flash memory is fabricated in a 63 nm CMOS technology with shallow trench isolation. The cell and chip sizes are 0.02 /spl mu/m/sup 2/ and 133 mm/sup 2/, respectively. Performance improves to 4.4 MB/s by using the 2/spl times/ program mode and by decreasing the cycle time from 50 ns to 30 ns. This also improves the read throughput to 23 MB/s.


international solid-state circuits conference | 2011

A 7MB/s 64Gb 3-bit/cell DDR NAND flash memory in 20nm-node technology

Kitae Park; Oh-Suk Kwon; Sangyong Yoon; Myung-Hoon Choi; In-Mo Kim; Bo-Geun Kim; Minseok S. Kim; Yoon-Hee Choi; Seung-Hwan Shin; Youngson Song; Joo-Yong Park; Jae-Eun Lee; Changgyu Eun; Ho-Chul Lee; Hyeong-Jun Kim; J.Y. Lee; Jong-Young Kim; Tae-Min Kweon; Hyun-Jun Yoon; Tae-hyun Kim; Dongkyo Shim; Jong-Sun Sel; Ji-Yeon Shin; Pan-Suk Kwak; Jinman Han; Keon-Soo Kim; Sung-Soo Lee; Young-Ho Lim; Tae-Sung Jung

Recently, the demand for 3b/cell NAND flash has been increasing due to a strong market shift from 2b/cell to 3b/cell in NAND flash applications, such as USB disk drives, memory cards, MP3 players and digital still cameras that require cost-effective flash memory. To further expand the 3b/cell market, high write and read performances are essential [1]. Moreover, the device reliability requirements for these applications is a challenge due to continuing NAND scaling to sub-30nm pitches that increases cell-to-cell interference and disturbance. We present a high reliability 64Gb 3b/cell NAND flash with 7MB/s write rate and 200Mb/s asynchronous DDR interface in a 20m-node technology that helps to meet the expanding market demand and application requirement.


international solid-state circuits conference | 2010

A 159mm 2 32nm 32Gb MLC NAND-flash memory with 200MB/s asynchronous DDR interface

Hyung-Gon Kim; Jung-Hoon Park; Kitae Park; Pan-Suk Kwak; Oh-Suk Kwon; Chulbum Kim; Youn-yeol Lee; Sang-Soo Park; Kyung Min Kim; Doohyun Cho; Ju-Seok Lee; Jungho Song; Soo-Woong Lee; Hyuk-Jun Yoo; Sanglok Kim; Seungwoo Yu; Sung-Jun Kim; Sung-Soo Lee; Kye-Hyun Kyung; Yong-Ho Lim; Chilhee Chung

Providing both low cost and high storage capacity by means of device scaling and multi-level cell has been a fundamental feature in developing of NAND flash memory to meet an ever-growing flash market. Recently, however, a high speed interface like DDR (Double Data Rate) was newly adopted in NAND flash to satisfy the requirement of emerging market such as SSD (Solid-State Disk) application where high read and write throughputs are demanded [1]. In addition, as NAND scaling further, a portion of data loading and data out times in overall NAND flash performance has been increased due to increasing page size from 2K to 8K bytes, and even up to 16K bytes at two-plane operation. It significantly affects overall performance degradation in not only SSD but also conventional flash card system. The high speed interface in NAND flash, however, causes to increase chip size because of multiple memory planes more than two and additional signal buses [1]. Therefore, a high speed data interface capability with minimized chip size penalty is required in DDR NAND flash. This paper presents 159mm2 32Gb MLC NAND flash which is capable of 200MB/s read and 12MB/s write throughputs in a 32nm technology.


international solid-state circuits conference | 2017

11.4 A 512Gb 3b/cell 64-stacked WL 3D V-NAND flash memory

Chulbum Kim; Ji-Ho Cho; Woopyo Jeong; Il-Han Park; Hyun Wook Park; Doohyun Kim; Dae-Woon Kang; Sung-Hoon Lee; Ji-Sang Lee; Won-Tae Kim; Jiyoon Park; Yang-Lo Ahn; Ji-Young Lee; Jong-Hoon Lee; Seung-Bum Kim; Hyun-Jun Yoon; Jaedoeg Yu; Nayoung Choi; Yelim Kwon; Nahyun Kim; Hwajun Jang; Jonghoon Park; Seung-Hwan Song; Yong-Ha Park; Jinbae Bang; Sangki Hong; Byung-Hoon Jeong; Hyun-Jin Kim; Chunan Lee; Young-Sun Min

The advent of emerging technologies such as cloud computing, big data, the internet of things and mobile computing is producing a tremendous amount of data. In the era of big data, storage devices with versatile characteristics are required for ultra-fast processing, higher capacity storage, lower cost, and lower power operation. SSDs employing 3D NAND are a promising to meet these requirements. Since the introduction of 3D NAND technology to marketplace in 2014 [1], the memory array size has nearly doubled every year [2,3]. To continue scaling 3D NAND array density, it is essential to scale down vertically to minimize total mold height. However, vertical scaling results in critical problems such as increasing WL capacitance and non-uniformity of stacked WLs due to variation in the channel hole diameter. To tackle these issues, this work proposes schemes for programming speed improvement and power reduction, and on-chip processing algorithms for error correction.


IEEE Journal of Solid-state Circuits | 2017

256 Gb 3 b/Cell V-nand Flash Memory With 48 Stacked WL Layers

Dongku Kang; Woopyo Jeong; Chulbum Kim; Doohyun Kim; Yong Sung Cho; Kyung-Tae Kang; Jinho Ryu; Kyung-Min Kang; Sung-Yeon Lee; Wandong Kim; Hanjun Lee; Jaedoeg Yu; Nayoung Choi; Dong-Su Jang; Cheon Lee; Young-Sun Min; Moosung Kim; An-Soo Park; Jae-Ick Son; In-Mo Kim; Pan-Suk Kwak; Bong-Kil Jung; Doo-Sub Lee; Hyung-Gon Kim; Jeong-Don Ihm; Dae-Seok Byeon; Jin-Yup Lee; Kitae Park; Kye-Hyun Kyung

A 48 WL stacked 256-Gb V-NAND flash memory with a 3 b MLC technology is presented. Several vertical scale-down effects such as deteriorated WL loading and variations are discussed. To enhance performance, reverse read scheme and variable-pulse scheme are presented to cope with nonuniform WL characteristics. For improved performance, dual state machine architecture is proposed to achieve optimal timing for BL and WL, respectively. Also, to maintain robust IO driver strength against PVT variations, an embedded ZQ calibration technique with temperature compensation is introduced. The chip, fabricated in a third generation of V-NAND technology, achieved a density of 2.6 Gb/mm2 with 53.2 MB/s of program throughput.


symposium on vlsi circuits | 2017

A 1.2V 1.33Gb/s/pin 8Tb NAND flash memory multi-chip package employing F-chip for low power and high performance storage applications

Hyun-Jin Kim; Young-don Choi; Jangwoo Lee; Jindo Byun; Seungwoo Yu; Daehoon Na; Jungjune Park; Kwang-won Kim; Anil Kavala; Youngmin Jo; Chang-Bum Kim; Sung-Hoon Kim; Nahyun Kim; Jaehwan Kim; Bong-Kil Jung; Yena Lee; Chanjin Park; Hansung Joo; Ki-Sung Kim; Yunhee Choi; Pan-Suk Kwak; Hyeonggon Kim; Jeong-Don Ihm; Dae-Seok Byeon; Jin-Yub Lee; Kitae Park; Kye-Hyun Kyung

A 1.2 V 1.33Gb/s/pin 8Tb NAND flash memory multi-chip package incorporating 16-die stacked 512-Gb NAND flash memories and F-Chip is presented. To meet the performance requirements of storage devices for higher capacity and faster data throughput, the 2nd generation F-Chip is developed. The F-Chip presents a dual bi-directional transceiver architecture including data retiming and training techniques to adaptively improve signal integrity. Besides, the F-Chip supports 1.2 V I/O for low power storage applications. This work, as a result, shows 33% improvement of eye-opening performances and 41% reduction of I/O power consumption compared to the previous generation.


international solid-state circuits conference | 2014

19.5 Three-dimensional 128Gb MLC vertical NAND Flash-memory with 24-WL stacked layers and 50MB/s high-speed programming

Kitae Park; Jinman Han; Dae-Han Kim; Sang-Wan Nam; Kihwan Choi; Min-Su Kim; Pan-Suk Kwak; Doo-Sub Lee; Yoon-He Choi; Kyung-Min Kang; Myung-Hoon Choi; Donghun Kwak; Hyun-Wook Park; Sang-Won Shim; Hyun-Jun Yoon; Doohyun Kim; Sang-Won Park; Kangbin Lee; Kuihan Ko; Dongkyo Shim; Yang-Lo Ahn; Jeunghwan Park; Jinho Ryu; Dong-Hyun Kim; Kyungwa Yun; Joonsoo Kwon; Seunghoon Shin; Dong-Kyu Youn; Won-Tae Kim; Tae-hyun Kim


Archive | 2007

Multi-chip package reducing peak power-up current

Pan-Suk Kwak

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