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Patra Michael

Carl Zeiss AG

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Publication

Featured researches published by Patra Michael.

Archive | 2012

Illumination lens for use in projection illumination system for extreme UV-projection lithography for manufacturing e.g. semiconductor chip, has first selection facet comprising larger surface than surfaces of second and third facets

Patra Michael

Archive | 2009

Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung

Deguenther Markus; Patra Michael; Layh Michael; Wangler Johannes; Maul Manfred; Fiolka Damian

Archive | 2014

Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik

Patra Michael

Archive | 2013

Illumination optics of optical system used in scanner for performing microlithography, has lighting channels whose total intensity in region of optical field is adapted by tilting specific number of individual mirrors to preset value

Patra Michael

Archive | 2014

Beleuchtungssystem für eine Projektionsbelichtungsanlage für die EUV-Projektionslithographie

Patra Michael

Archive | 2013

Illumination device for use in microlithographic projection exposure system, has polarization influencing optical element attached to reflecting side surface so that state of polarization of light beam on beam path is differently influenced

Patra Michael

Archive | 2008

Illumination optics for use in microlithography projection illumination system, has place and time-dissolved detection device arranged such that device detects light intensity distribution based on light intensity distribution in plane

Patra Michael; Deguenther Markus; Layh Michael; Wangler Johannes; Maul Manfred

Archive | 2014

Verfahren zum Zuordnen einer zweiten Facette eines im Strahlengang zweiten facettierten Elements einer Beleuchtungsoptik

Patra Michael

Archive | 2014

Verfahren zur Beleuchtung eines Bildfeldes

Patra Michael

Archive | 2013

Illumination lens for lighting system of scanner to manufacture e.g. memory chips, has optical component for guiding light to field, where lens is formed such that beam tufts are overlaid for coinciding edges of beam tufts in sections

Patra Michael

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Deguenther Markus

Carl Zeiss AG

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Layh Michael

Carl Zeiss AG

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Maul Manfred

Carl Zeiss AG

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Wangler Johannes

Carl Zeiss AG

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Fiolka Damian

Carl Zeiss AG

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