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Publication
Featured researches published by Peter H. Mitchell.
Ibm Journal of Research and Development | 1997
Steven J. Holmes; Peter H. Mitchell; Mark C. Hakey
Deep-UV (DUV) lithography has been developed to scale minimum feature sizes of devices on semiconductor chips to sub-half-micron dimensions. This paper reviews early manufacturing experiences at the IBM Microelectronics Division with deep ultraviolet (DUV) lithography at a 248-nm wavelength. Critical steps in the processing of 1Mb DRAM, 16Mb DRAM, and logic gate conductors in devices are discussed. The evolution of DUV lithography tools is also briefly reviewed.
Archive | 2003
Mark C. Hakey; David Vaclav Horak; Charles W. Koburger; Peter H. Mitchell
Archive | 2003
David Vaclav Horak; Charles W. Koburger; Peter H. Mitchell; Larry Alan Nesbit
Archive | 2004
Mark C. Hakey; David V. Horak; Charles W. Koburger; Peter H. Mitchell
Archive | 2004
Mark C. Hakey; David V. Horak; Charles W. Koburger; Peter H. Mitchell
Archive | 2004
Toshiharu Furukawa; Mark C. Hakey; Steven J. Holmes; David Vaclav Horak; Charles W. Koburger; Peter H. Mitchell
Archive | 2004
Toshiharu Furukawa; Mark C. Hakey; David Vaclav Horal; Charles W. Koburger; Peter H. Mitchell
Archive | 2007
Toshiharu Furukawa; Mark C. Hakey; Steven J. Holmes; David Vaclav Horak; Charles W. Koburger; Peter H. Mitchell; Larry Alan Nesbit
Archive | 2004
Toshiharu Furukawa; Mark C. Hakey; David Vaclav Horak; Charles W. Koburger; Mark Eliot Masters; Peter H. Mitchell; Stanislav Polonsky
Archive | 2005
Toshiharu Furukawa; Mark C. Hakey; David V. Horak; Charles W. Koburger; Mark Eliot Masters; Peter H. Mitchell
