Peter I. Porshnev

Performance Enhancement of PFET Planar Devices by Plasma Immersion Ion Implantation (P3I)

A study of doping the pMOS Lightly Doped Drain (LDD) by Plasma Immersion Ion Implantation (P3i) with BF3 is presented which demonstrates a better transistor performance compared to standard beam line Ion Implantation (I/I). The benefit of P3i comes from the broad angular distribution of the impinging ions thereby doping the poly‐silicon gate sidewall as well. Gate capacitance of short channel devices has been measured and clearly shows this improvement. This model is clearly supported by high resolution 2D‐carrier profiles using Scanning Spreading Resistance Microscopy (SSRM) which shows this gate sidewall doping. The broad angular distribution also implies a smaller directional sensitivity (to for instance the detailed gate edge shape) and leads to devices which are perfectly balanced, when Source and Drain electrode are switched.