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Dive into the research topics where Quyen Pham is active.

Publication


Featured researches published by Quyen Pham.


Archive | 1999

Method for improved remote microwave plasma source for use with substrate processing system

Chien-Teh Kao; Kenneth Tsai; Quyen Pham; Ronald L. Rose; Calvin R. Augason; Joseph Yudovsky


Archive | 2001

Monitoring an effluent from a chamber

Kenneth Tsai; Tung Bach; Quyen Pham


Archive | 1997

Apparatus for improved remote microwave plasma source for use with substrate processing systems

Chien-Teh Kao; Kenneth Tsai; Quyen Pham; Ronald L. Rose; Calvin R. Augason; Joseph Yudovsky


Archive | 2003

Method and apparatus for dynamically measuring the thickness of an object

Lawrence C. Lei; Siqing Lu; Yu Chang; Cecilia Martner; Quyen Pham; Yu Ping Gu; Joel M. Huston; Paul Smith; Gabriel Lorimer Miller


Archive | 2002

Oxide treatment and pressure control for electrodeposition

Harald Herchen; Henan Hao; Timothy R. Webb; Quyen Pham; Son Trinh; Deenesh Padhi


Archive | 2003

Method and apparatus for measuring object thickness

Lawrence C. Lei; Siqing Lu; Yu Chang; Cecilia Martner; Quyen Pham; Yu Ping Gu; Joel M. Huston; Paul Smith; Gabriel Lorimer Miller


Archive | 2003

Method and apparatus for measuring thickness of a test object between two eddy current sensor heads

Lawrence C. Lei; Siqing Lu; Yu Chang; Cecilia Martner; Quyen Pham; Yu Ping Gu; Joel M. Huston; Paul Smith; G. Laurie Miller


Archive | 2006

Apparatus and method of dynamically measuring thickness of a layer of a substrate

Lawrence C. Lei; Siqing Lu; Yu Chang; Cecilia Martner; Quyen Pham; Yu P. Gu; Joel M. Huston; Paul Smith; G. Lorimer Miller


Archive | 2001

Monitoring of effluent from chamber

Tung Bach; Quyen Pham; Kenneth Tsai; ファム クイエン; ツァイ ケニス; バーチ ツン


Archive | 2008

Method and apparatus for measuring a thickness of a layer of a wafer

Lawrence C. Lei; Siqing Lu; Yu Chang; Cecilia Martner; Quyen Pham; Yu Ping Gu; Joel M. Huston; Paul Smith; Gabriel Lorimer Miller

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