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Dive into the research topics where Ralf Lerner is active.

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Featured researches published by Ralf Lerner.


2011 Semiconductor Conference Dresden | 2011

Device engineering for a modular 650 V transistor assortment

Ralf Lerner; Klaus Schottmann; Gabriel Kittler

Using a trench isolated 650 V quasi-vertical n-channel DMOS as a starting point several new 650 V transistor types have been evaluated. Mainly by design measures a 650 V depletion DMOS, a 650 V PMOS and a 650 V IGBT were created for a modular integration into the process flow. Design modifications like increased channel length, well constructions and drain modifications were used to create the new devices. Original n-channel DMOS design features like curvatures or field plate constructions have been re-used. Necessary new process steps for the depletion transistor and for the IGBT were kept to minimum additional process effort and use a flexible process approach with independent addable modules.


international conference on microelectronics | 2002

PT-IGBT and freewheeling diode for 3.3 kV using lifetime control techniques and low-efficiency emitters

Mario Netzel; Ralf Lerner; Ralf Siemieniec; Josef Lutz

The adjustment of emitter efficiency by variation of doping profiles or application of lifetime control techniques such as irradiation of electrons and helium are two generally recognized concepts for the improvement of power device characteristics. In this work both concepts were studied by use of device simulation for the development of an IGBT and freewheeling diode chipset for 3.3 kV. Simulations were performed using an extended recombination model and recombination center data taken from measurements at different irradiated devices. Finally, this lead to the manufacturing of an IGBT using low-emitter efficiency and an irradiated freewheeling diode. The experimental results are in good accordance with the previously performed simulations and give evidence of the capabilities of present device simulation tools.


Archive | 2011

Verfahren zur Herstellung von Siliziumhalbleiterscheiben mit III-V-Schichtstrukturen für die Integration von Siliziumbauelementen mit auf Gruppe III-V-Schichtstrukturen basierenden High Electron Mobility Transistoren (HEMT) und entsprechende Halbleiterschichtanordnung

Gabriel Kittler; Ralf Lerner


Archive | 2011

Verfahren zur Herstellung von Siliziumhalbleiterscheiben mit Schichtstrukturen zur Integration von III-V Halbleiterbauelementen

Gabriel Kittler; Ralf Lerner


Archive | 2003

Mutually insulated MOSFETs with extended drain region for higher voltages, forming components of integrated circuits in silicon on insulator (SOi) technology, with each transmitter active semiconductor layer surrounded completely

Ralf Lerner; Gunter Stoll; Klaus Schottmann


Facta universitatis. Series electronics and energetics | 2015

COMPARISON OF DIFFERENT DEVICE CONCEPTS TO INCREASE THE OPERATING VOLTAGE OF A TRENCH ISOLATED SOI TECHNOLOGY TO ABOVE 900V

Ralf Lerner; Klaus Schottmann; Siegfried Hering; Andreas Käberlein; Matthias Fritzsch; Klaus Schneider; Daniel Beyer; Steffen Heinz


Archive | 2013

Method for defining design rules to design field plates of structures of semiconductor transistors in integrated circuit, involves carrying out longitudinal extension of field plates against reverse voltage corresponding to field plates

Ralf Lerner; Gabriel Kittler


Archive | 2011

Entwurfsregeln für ein Layout von MOS-Transistoren mit unterschiedlichen Durchbruchspannungen in einer integrierten Schaltung Design rules for a layout of MOS transistors with different breakdown voltages in an integrated circuit

Ralf Lerner; Gabriel Kittler


Archive | 2010

DMOS-Transistor mit erhöhter Durchbruchsspannung und Verfahren zur Herstellung. DMOS transistor with an increased breakdown voltage and process for preparing.

Ralf Lerner; Phil Hower; Gabriel Kittler; Klaus Schottmann


Archive | 2003

Isolierte MOS-Transistoren mit ausgedehntem Drain-Gebiet für erhöhte Spannungen Isolated MOS transistors with extended drain region for increased tensions

Ralf Lerner; Klaus Schottmann; Gunter Stoll

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Josef Lutz

Chemnitz University of Technology

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Matthias Fritzsch

Chemnitz University of Technology

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Steffen Heinz

Chemnitz University of Technology

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