Ralf Scharnweber | Researchain

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Featured researches published by Ralf Scharnweber.

Archive | 2005

Illumination system for a microlithographic projection exposure apparatus

Damian Fiolka; Ralf Lindner; Ralf Scharnweber

Archive | 2009

Illumination optics for euv microlithography and illumination system and projection exposure apparatus comprising an illumination optics of this type

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stützle; Jens Ossmann; Ralf Scharnweber; Markus Hauf; Udo Dinger; Severin Waldis; Marc Kirch; Joachim Hartjes

Archive | 2008

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

Oliver Wolf; Heiko Siekmann; Eva Kalchbrenner; Siegfried Rennon; Johannes Wangler; Andre Bresan; Michael Gerhard; Nils Haverkamp; Axel Scholz; Ralf Scharnweber; Michael Layh; Stefan Burkart

Archive | 2010

Method for a multiple exposure, microlithography projection exposure installation and a projection system

Ralf Scharnweber

Archive | 2010

Illumination optics for EUV microlithography and related system and apparatus

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stuetzle; Jens Ossmann; Ralf Scharnweber; Markus Hauf; Udo Dinger; Severin Waldis; Marc Kirch; Joachim Hartjes

Archive | 2009

Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stützle; Jens Ossmann; Ralf Scharnweber

Archive | 2006

Illuminating device of a microlithographic projection exposure system

Damian Fiolka; Michael Totzeck; Ralf Scharnweber; Jörg Zenke

Archive | 2005

ILLUMINATION SYSTEM IN PROJECTION ALIGNER FOR MICROLITHOGRAPHY

Damian Fiolka; Ralf Lindner; Ralf Scharnweber; ダミアン・フィオルカ; ラルフ・シャーンウェバー; ラルフ・リンドナー

Archive | 2005

Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem

Ralf Scharnweber

Archive | 2011

Optical system for a microlithographic projection apparatus

Ingo Sänger; Ralf Scharnweber; Olaf Dittmann; Toralf Gruner; Gundula Weiss; András G. Major; Martin Vogt; Markus Degünther; Johannes Wangler; Thomas Korb; Severin Waldis

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