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Roland Sauerbrey

Carl Zeiss AG

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Publication

Featured researches published by Roland Sauerbrey.

International Conference on Ultrafast Phenomena | 2000

Enhancement of K_alpha yield from femtosecond laser produced plasmas by automated control of plasma parameters

Christian Ziener; I. Uschmann; Gregor Stobrawa; Thomas Feurer; Heinrich Schwoerer; Roland Sauerbrey

We demonstrate the automated optimization of Kα emission from silicon, titanium and cobalt, generated in a multi-terawatt femtosecond laser produced plasma. The plasma parameters were adjusted by a newly developed laser prepulse device.

Archive | 2006

Arrangement for optimizing the pulse shape in a laser scanning microscope

Ralf Wolleschensky; Thomas Feurer; Roland Sauerbrey

Archive | 2003

Arrangement for the optical detection of a moving target flow for a pulsed energy beam pumped radiation

Gregor Stobrawa; Mark Bischoff; Roland Sauerbrey; Wolfgang Ziegler; Klaus Ruehle

Archive | 1999

Anordnung zur Optimierung der Pulsform in einem Laser-Scanning-Mikroskop

Ralf Wolleschensky; Thomas Feurer; Roland Sauerbrey

Archive | 1999

Arrangement for optimization of pulse shape of laser scanning microscope has beam division and recombination devices separation by beam manipulator for spectral division of laser light beam

Ralf Wolleschensky; Thomas Feurer; Roland Sauerbrey

Archive | 2002

Material processing with large spectral bandwidth laser pulses involves varying spectral parameters of laser pulses before and/or during processing to achieve defined effect specific to processing

Mark Bischoff; Martin Hacker; Roland Sauerbrey; Gregor Stobrawa; Wolfgang Ziegler

Archive | 2011

Material processing method using laser pulse having wide spectrum band width, and device for implementing the method

Mark Bischoff; Martin Hacker; Roland Sauerbrey; Gregor Stobrawa; Wolfgang Ziegler; ザゥアーブライ、ローランド; ストプラヴァ、グレゴール; ツィーグラー、ヴォルフガング; ハッカー、マルティン; ビショフ、マルク

Archive | 2003

Optical detector for a moving target stream for a pulsed pumped generator for soft x-rays or extreme ultraviolet is remote from the plasma to avoid damage

Mark Bischoff; Klaus Rühle; Roland Sauerbrey; Gregor Stobrawa; Wolfgang Ziegler

Archive | 2003

Verfahren zur Materialbearbeitung mit Laserimpulsen grosser spektraler Bandbreite und Vorrichtung zur Durchführung des Verfahrens Method for machining material with laser pulses large spectral bandwidth and device for carrying out the method

Mark Bischoff; Martin Hacker; Roland Sauerbrey; Gregor Dipl.-Phys. Stobrawa; Wolfgang Ziegler

Archive | 2003

Ultrafast EUV Lithography

S. Düsterer; Heinrich Schwoerer; Wolfgang Ziegler; Roland Sauerbrey

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Thomas Feurer

Carl Zeiss AG

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Wolfgang Ziegler

University of Jena

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Gregor Stobrawa

University of Jena

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Mark Bischoff

University of Jena

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Ralf Wolleschensky

Carl Zeiss AG

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Heinrich Schwoerer

Stellenbosch University

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Christian Ziener

University of Jena

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F. Ewald

University of Jena

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Georg Pretzler

Max Planck Society

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I. Uschmann

University of Jena

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