Ruud Johannes Antonius Steenwelle

Ferroelectric properties of epitaxial Pb(Zr,Ti)O3 thin films on silicon by control of crystal orientation

Crystalline Pb(Zr,Ti)O3 (PZT) thin films between metallic-oxide SrRuO3 (SRO) electrodes were prepared using pulsed laser deposition on CeO2/yttria-stabilized zirconia buffered silicon (001) substrates. Different deposition conditions for the initial layers of the bottom SRO electrode result in an orientation switch. Either (110)- or (001)-oriented SRO thin films are obtained and the PZT films deposited on the bottom electrode continued both growth directions. The ferroelectric characteristics of the SRO/PZT/SRO capacitors are found to be strongly dependent on their crystalline orientation: PZT (001)-oriented thin films showed stable, high quality ferroelectric response, while the remnant polarization of the PZT (110)-oriented thin films only show high response after multiple switching cycles.

Misfit strain dependence of ferroelectric and piezoelectric properties of clamped (001) epitaxial Pb(Zr0.52,Ti0.48)O3 thin films

A study on the effects of the residual strain in Pb(Zr0.52Ti0.48)O3 (PZT) thin films on the ferroelectric and piezoelectric properties is presented. Epitaxial (001)-oriented PZT thin film capacitors are sandwiched between SrRuO3 electrodes. The thin film stacks are grown on different substrate-buffer-layer combinations by pulsed laser deposition. Compressive or tensile strain caused by the difference in thermal expansion of the PZT film and substrate influences the ferroelectric and piezoelectric properties. All the PZT stacks show ferroelectric and piezoelectric behavior that is consistent with the theoretical model for strained thin films in the ferroelectric r-phase. We conclude that clamped (001) oriented Pb(Zr0.52Ti0.48)O3 thin films strained by the substrate always show rotation of the polarization vector

Characterization of epitaxial Pb(Zr,Ti)O3 thin films deposited by pulsed laser deposition on silicon cantilevers

This paper reports on the piezoelectric-microelectromechanical system micro-fabrication process and the behavior of piezoelectric stacks actuated silicon cantilevers. All oxide layers in the piezoelectric stacks, such as buffer-layer/bottom-electrode/film/top-electrode: YSZ/SrRuO3/Pb(Zr,Ti)3/SrRuO3, were grown epitaxially on the Si template of silicon-on-insulator substrates by pulsed laser deposition. By using an analytical model and finite element simulation, the initial bending of the cantilevers was calculated. These theoretical analyses are in good agreement with the experimental results which were determined using a white light interferometer. The dependences of the cantilever displacement, resonance frequency and quality factor on the cantilever geometry have been investigated using a laser-Doppler vibrometer. The tip displacement ranged from 0.03 to 0.42 µm V−1, whereas the resonance frequency and quality factor values changed from 1010 to 18.6 kHz and 614 to 174, respectively, for the cantilevers with lengths in the range of 100–800 µm. Furthermore, the effect of the conductive oxide electrodes on the stability of the piezoelectric displacement of the cantilevers has been studied.

Enhanced piezoelectric properties of (110)-oriented PbZr1−xTixO3 epitaxial thin films on silicon substrates at shifted morphotropic phase boundary

Piezoelectrical, ferroelectrical, and structural properties of epitaxial pseudocubic (110)pc oriented 500 nm thick PbZr1−xTixO3 thin films, prepared by pulsed laser deposition on (001) silicon substrates, were measured as a function of composition. The dependence of the measurement data on the Ti content is explained by an abrupt transition from the rhombohedral r-phase to the tetragonal (c/a) 45 phase for x  ≈  0.6, indicating a shift of the Morphotropic Phase Boundary to this value, where the effective piezoelectric coefficient e3 1 ,eff and dielectric constant e33 ,eff reach their maximum values. These findings are of great significance for Si-based piezo-micro electro mechanical systems, in particular energy harvesters. The largest value of the figure-of-merit for such devices was found for x  = 0.6, FOM=24.0 GPa

Ferroelectric and dielectric properties of Pb(Zr,Ti)O 3 thin film capacitors

Ferroelectric thin films with compositions PbZr0.52Ti0.48O3 (PZT) have been processed by pulsed laser deposition on the SrRuO3(110)/YSZ(001)/Si(001) substrates. The obtained films are polycrystalline, with perovskite structure and the (110)-dominant orientation. The columnar structure was observed by cross-sectional scanning electron microscopy (SEM). The polarization hysteresis loops (P-E), capacitance-voltage (C-V) and dielectric properties with different frequency were studied. The 250 nm thick PZT film showed the remnant polarization of 25 µC/cm2 and coercive electric field of 34.1 kV/cm at 200 kV/cm amplitude and 1 kHz frequency. The dielectric constant and dissipation factor were measured to be 1255 and 0.04 at room temperature and 10 kHz frequency, respectively. The existence of the interfacial dead-layer at the electrode-film interface can be evaluated from capacitance dependence on the film thickness.

In-line picogram-resolution microchannel resonator for protein adsorption measurements operating at atmospheric pressure

This paper reports on an in-line microchannel resonator for protein adsorption measurement with a resolution of 19 pg. The sensor eliminates the need for complex measurement sequences, vacuum environment or delicate external (optical) components.