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Japanese Journal of Applied Physics | 2005

Adsorption of Dibutyl Phthalate and Dioctyl Phthalate on Si Substrate

Hironobu Miya; Ryota Sasajima; Eiko Takami; Naoto Nakamura; Takayuki Takahagi

The behaviors of organic compounds such as dibutyl phthalate (DBP) or dioctyl phthalate (DOP) on a Si substrate are investigated by gas chromatograph and mass analysis (GC–MS). DBP or DOP source is set in a chemically clean booth, and organic amount is measured in air and on the substrate. At various concentrations of DBP or DOP, organic adsorption amount is measured and this amount is expressed by the Langmuir equation. In a mixed-gas atmosphere, the amounts of DBP and DOP are measured and it is clear that DBP concentration decreases when the total organic amount exceeds the saturated adsorption amount on the substrate. This phenomenon is understood as the replacement of DBP by DOP. In this paper, we describe the adsorption amount quantitatively in individual atmosphere of DBP or DOP and a mixed-gas atmosphere.


Japanese Journal of Applied Physics | 2005

Slip Generation in Si Wafers due to Friction-Induced Stress and Its Suppression Technique

Iwao Nakamura; Ryota Sasajima; Keishin Yamazaki; Naoto Nakamura; Sadao Nakashima

Slip-free 300 mm wafers annealed at temperatures higher than 1000°C have been investigated. It has been found that friction-related stress must be introduced to explain slip generation experimentally in addition to gravitationally induced bending stress, compressive stress and thermally induced stress. Slip-free 300 mm wafers annealed at 1350°C are obtained by appropriately controlling the surface roughness of the supporting disk.


Archive | 2011

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus

Yoshiro Hirose; Yushin Takasawa; Tsukasa Kamakura; Yoshinobu Nakamura; Ryota Sasajima


Archive | 2010

Method of manufacturing semiconductor device, and substrate treatment device

義朗 ▲ひろせ▼; Hisanori Akae; Yoshiro Hirose; Yosuke Ota; Ryota Sasajima; Hiromasa Takazawa; 陽介 太田; 亮太 笹島; 尚徳 赤江; 裕真 高澤


Archive | 2005

Heat treatment apparatus and method of manufacturing substrates

Ryota Sasajima; Iwao Nakamura


Archive | 2005

Heat Treatment Apparatus and Method of Manufacturing Substrate

Ryota Sasajima; Iwao Nakamura; Akira Morohashi; Ryuji Yamamoto


Archive | 2010

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND SEMICONDUCTOR DEVICE

Tatsuyuki Saito; Kazuhiro Yuasa; Yoshiro Hirose; Yuji Takebayashi; Ryota Sasajima; Katsuhiko Yamamoto; Hirohisa Yamazaki; Shintaro Kogura; Hirotaka Hamamura


Archive | 2005

Heat treatment device and method of manufacturing substrate

Ryota Sasajima; Iwao Nakamura


Archive | 2012

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM

Yosuke Ota; Naonori Akae; Yoshiro Hirose; Ryota Sasajima


Archive | 2006

Substrate treatment apparatus, method for manufacturing substrate, and method for manufacturing semiconductor device

Keishin Yamazaki; Iwao Nakamura; Ryota Sasajima

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