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Dive into the research topics where Satyanarayana V. Nitta is active.

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Featured researches published by Satyanarayana V. Nitta.


international interconnect technology conference | 2008

Performance and reliability of airgaps for advanced BEOL Interconnects

Satyanarayana V. Nitta; Daniel C. Edelstein; Shom Ponoth; Lawrence A. Clevenger; Xio Hu Liu; Theodorus E. Standaert

In this paper we present new modeling and measured data to address detailed performance and reliability considerations of multi-level airgaps. Using finite element modeling, we analyzed the capacitance distributions in the airgaps while restricting openings in the cap layers for increased mechanical and electrical reliability. Despite this restriction, capacitance reductions can be maximized by expanding the gap in the low-k SiCOH dielectric underneath the cap, and by increasing gap depth. Relevant BEOL simulation, performance and reliability data has been obtained and will be presented in this context


Archive | 2002

Multilayer interconnect structure containing air gaps and method for making

Alfred Grill; Jeffrey C. Hedrick; Christopher V. Jahnes; Satyanarayana V. Nitta; Kevin S. Petrarca; Sampath Purushothaman; Katherine L. Saenger; Stanley Joseph Whitehair


Archive | 2000

Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material

Alfred Grill; Jeffrey C. Hedrick; Christopher V. Jahnes; Satyanarayana V. Nitta; Kevin S. Petrarca; Sampath Purushothaman; Katherine L. Saenger; Stanley Joseph Whitehair


Archive | 2002

Robust ultra-low k interconnect structures using bridge-then-metallization fabrication sequence

Matthew E. Colburn; Elbert E. Huang; Satyanarayana V. Nitta; Sampath Purushothaman; Katherine L. Saenger


Archive | 2004

Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics

Nirupama Chakrapani; Matthew E. Colburn; Christos D. Dimitrakopoulos; Dirk Pfeiffer; Sampath Purushothaman; Satyanarayana V. Nitta


Archive | 2007

Device and methodology for reducing effective dielectric constant in semiconductor devices

Daniel C. Edelstein; Matthew E. Colburn; Edward C. Cooney; Timothy J. Dalton; John A. Fitzsimmons; Jeffrey P. Gambino; Elbert E. Huang; Michael Lane; Vincent J. McGahay; Lee M. Nicholson; Satyanarayana V. Nitta; Sampath Purushothaman; Sujatha Sankaran; Thomas M. Shaw; Andrew H. Simon; Anthony K. Stamper


Archive | 2002

Method for forming a porous dielectric material layer in a semiconductor device and device formed

Timothy J. Dalton; Stephen E. Greco; Jeffrey C. Hedrick; Satyanarayana V. Nitta; Sampath Purushothaman; Kenneth P. Rodbell; Robert Rosenberg


Archive | 2012

Microelectronic structure including air gap

Daniel C. Edelstein; David V. Horak; Elbert E. Huang; Satyanarayana V. Nitta; Takeshi Nogami; Shom Ponoth; Terry A. Spooner


Archive | 2001

Ordered two-phase dielectric film, and semiconductor device containing the same

Stephen M. Gates; Christopher B. Murray; Satyanarayana V. Nitta; Sampath Purushothaman


Archive | 2008

Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same

Matthew E. Colburn; Stephen M. Gates; Jeffrey C. Hedrick; Elbert E. Huang; Satyanarayana V. Nitta; Sampath Purushothaman; Muthumanickam Sankarapandian

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