Se-Kyung Kang

Effects of high potential barrier on InAs quantum dots and wetting layer

Effects of a thin AlAs layer (1 nm) with different position on InAs quantum dots (QDs) and wetting layer have been investigated by transmission electron microscopy (TEM), photoluminescence (PL), and photoreflectance (PR). The PL peak position of InAs QDs directly grown on the thin AlAs is blueshifted from that of InAs QDs grown on the GaAs layer by 171 meV mainly due to the high potential barrier and reduced dot size shown in the TEM image. As the additional GaAs layer (1 and 2 nm) is inserted on top of the AlAs layer, the PL peak position is systematically shifted toward longer wavelength with increase in the thickness. Temperature dependent PL of QD samples shows that a thin AlAs layer significantly influences the thermal activation energy. The wetting layer related peak in PR spectra is changed to lower energy with increase in the thickness of an additional GaAs layer, which is mainly caused by the reduction in the effects of the AlAs layer.

Growth of Si-doped InAs quantum dots and annealing effects on size distribution

We investigated the Si-doped InAs quantum dots (QDs) grown by molecular beam epitaxy and the annealing effects on the QD size distribution through photoluminescence (PL) spectroscopy. A double-peak feature in PL was observed from as-grown InAs QDs with Si-doping, and excitation intensity dependence of PL indicated that the double-peak feature is related to the ground-state emission from InAs QDs with bimodal size distribution. The PL spectrum from Si-doped InAs QDs subjected to annealing treatment at 800°C in nitrogen ambient showed three additional PL peaks and blue-shift of the double-peak feature observed from as-grown sample. The excitation-intensity-dependent PL and consideration of thermal stability of carriers through temperature-dependent PL measurement demonstrated that three additional peaks come from the InAs QDs with three new branches of QD occurring during annealing process.

Optical and structural prorerties of InAs epilayer on graded InGaAs

We have studied infrared photoluminescence (PL) and x-ray diffraction (XRD) of 400 nm and 1500 nm thick InAs epilayers on GaAs, and 4 nm thick InAs on graded InGaAs layer with total thickness of 300 nm grown by molecular beam epitaxy. The PL peak positions of 400 nm, 1500 nm and 4 nm InAs epilayer measured at 10 K are blue-shifted from that of InAs bulk by 6.5, 4.5, and 6 meV, respectively, which can be largely explained by the residual strain in the epilayer. The residual strain caused by the lattice mismatch between InAs and GaAs or graded InGaAs/GaAs was observed from XRD measurements. While the PL peak position of 400 nm thick InAs layer is linearly shifted toward higher energy with increase in excitation intensity ranging from 10 to 140 mW, those of 4 nm InAs epilayer on InGaAs and 1500 nm InAs layer on GaAs is gradually blue-shifted and then, saturated above a power of 75 mW. These results suggest that adopting a graded InGaAs layer between InAs and GaAs can efficiently reduce the strain due to lattice mismatch in the structure of InAs/GaAs.