Sebastian Oestreich

Progress in Mo/Si multilayer coating technology for EUVL optics

Extensive optimization on the fabrication of Mo/Si multilayer systems is carried out at the FOM Institute Rijnhuizen using e-beam evaporation. The process is being optimized including parameters such as variation of the mirrors center wavelength, the metal fraction, deposition parameters, and the layer composition. Reflectivities of 69.5% are demonstrated at normal incidence, with values of 67 to 69% being routinely achieved, demonstrating the capabilities of the deposition process. Some evidence of smoothening to interface roughness values lower than the roughness of the initial substrate is given. Furthermore, investigation of the temporal behavior of the coatings does not indicate any loss of reflectivity over an eight-month period. An analysis of the multilayer composition and the interface roughness is given. The reflectivity measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin. The results of measurements at both facilities are found to be identical and accuracy is discussed in detail.

New PTB beamlines for high-accuracy EUV reflectometry at BESSY II

High-accuracy characterization of optical components has been one of the main services of the PTB radiometry laboratory at BESSY I. Now, after the shut down of BESSY I with the end of 1999, PTB is operating two new beamlines suitable for EUV reflectometry at their new laboratory at BESSY II. As at BESSY I, synchrotron radiation from a bending magnet is used for reflectometry but additionally a beamline at an undulator covering the same spectral range from 50 eV to 1800 eV can be used for special applications where, e.g., high radiant power or very high spectral purity is needed. In this paper, the characteristics of the beamlines are presented. We present the results of the beamline characterization on photon flux, spectral resolution, spectral purity and beam stability with special respect to the EUV photon energy range. During the phase of simultaneous operation of BESSY I and II in 1999, a direct comparison was done for reflectance measurements at high equality Mo/Si EUV mirrors. The results showed perfect agreement: (68.98 +/- 0.17)% at BESSY I and (69.10 +/- 0.24)% at BESSY II. The wavelength scale was calibrated using the absorption resonances of Ar, Kr, and Xe whose energies are known with a relative uncertainty of about 10-4. The measured peak positions agreed within this uncertainty.

Multilayer reflectance during exposure to EUV radiation

Mo/S multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm2 were applied at the PB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3 X 10-8 mbar (without hydrocarbons) and 10-7 mbar (with hydrocarbons) at EUV intensities of 3 mW/mm2, respectively 0.2 mW/mm2 have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using UV produced ozone from air at atmospheric pressure, were performed and show that Mo/S mirrors do not suffer from prolonged exposure to ozone.