Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Shu Shimada is active.

Publication


Featured researches published by Shu Shimada.


Proceedings of SPIE, the International Society for Optical Engineering | 2006

A new model of haze generation and storage-life-time estimation for mask

Shu Shimada; N. Kanda; Noriyuki Takahashi; H. Nakajima; Hiroko Tanaka; Hiroyuki Ishii; Yusuke Shoji; Masashi Ohtsuki; A. Naitoh; N. Hayashi

After quartz blanks with various sulfate ion amount on the surfaces were exposed by an ArF laser, growing defects, haze, on the surfaces were consequently counted by an inspection tool. As a result, the number of haze largely depends on the sulfate ion amount, and it is found that no haze is generated when the sulfate ion amount is smaller than a threshold value. A new haze generation model is provided to explain the threshold phenomenon. And then storage impact on increase of the sulfate ion amount was investigated. The sulfate ion amount increases with storage time and airborne SOx concentration. From the results, the adsorption coefficient of an extended Langmuir equation was calculated, and the adsorption phenomenon was analyzed in detail. Simulation results show that it is recommended, regarding for storage environment, to keep under 0.01 ppbv airborne SOx concentration in order to prevent haze for one year.


Archive | 2006

GRADATED PHOTOMASK AND ITS FABRICATION PROCESS

Junji Fujikawa; Shu Shimada; Yuuichi Yoshida; Shiho Sasaki; Tsuyoshi Amano; Kimio Ito; Nobuhito Toyama; Hiroshi Mohri


Archive | 2006

Photomask, its manufacturing method, and pattern transfer method

Takeshi Amano; Natsumi Furuyama; Hiroshi Mori; Shiho Sasaki; Shu Shimada; Yuichi Yoshida; 志保 佐々木; 奈津美 古山; 雄一 吉田; 剛 天野; 周 島田; 弘 毛利


Archive | 2007

METHOD FOR CLEANING PHOTO MASK

Shu Shimada; Noriyuki Takahashi; Hiroko Tanaka; Hiroyuki Ishii; Yusuke Shoji; Masashi Ohtsuki


Archive | 2006

Photomask having gray scale and method of manufacturing the same

Takeshi Amano; Junji Fujikawa; Kimio Ito; Hiroshi Mori; Shiho Sasaki; Shu Shimada; Nobuto Toyama; Yuichi Yoshida; 公夫 伊藤; 志保 佐々木; 雄一 吉田; 剛 天野; 周 島田; 弘 毛利; 登山 伸人; 潤二 藤川


Archive | 2005

Photomask, method for manufacturing the same, and pattern transfer method

Takashi Adachi; Natsumi Furuyama; Yuichi Inazuki; Takashi Meshida; Hiroshi Mori; Yasutaka Morikawa; Shiho Sasaki; Shu Shimada; Takanori Sudo; Nobuto Toyama; Yuichi Yoshida; 志保 佐々木; 奈津美 古山; 敬 召田; 雄一 吉田; 俊 安達; 周 島田; 泰考 森川; 弘 毛利; 登山 伸人; 友一 稲月; 貴規 須藤


Archive | 2005

Photomask, method for manufacturing same, and method for transferring pattern

Takeshi Amano; Natsumi Furuyama; Hiroshi Mori; Shiho Sasaki; Shu Shimada; Yuichi Yoshida; 志保 佐々木; 奈津美 古山; 雄一 吉田; 剛 天野; 周 島田; 弘 毛利


Archive | 2007

METHOD FOR MANAGING LIGHT EXPOSURE MASK AND LIGHT EXPOSURE MASK

Shu Shimada; Hideki Yamamoto; Akihiko Naitoh


Archive | 2007

METHOD OF CLEANING STORAGE CASE

Shu Shimada; Noriyuki Takahashi; Hiroyuki Nakajima; Hiroko Tanaka; Nobuyuki Kanda


Archive | 2007

Verfahren zur Reinigung von Photomasken A method for cleaning photomasks

Shu Shimada; Noriyuki Takahashi; Hiroko Tanaka; Hiroyuki Ishii; Yusuke Shoji; Masashi Ohtsuki

Collaboration


Dive into the Shu Shimada's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge