Simon Ruffell
Varian Semiconductor
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Publication
Featured researches published by Simon Ruffell.
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | 2015
Simon Ruffell; Anthony Renau
The authors describe a new directed ribbon-beam system capable of a combination of plasma-based processing with that of a ribbon-ion-beam implantation system. In particular, the authors describe how they are utilizing this system for novel reactive-ion-etching processing with high directionality in the planes perpendicular to the wafer surface and at angles non-normal to the wafer. Examples are shown on nanopatterned structures. The authors demonstrate how these results and capability can solve several problems in current and future device patterning.
Archive | 2013
Alexander C. Kontos; Steven Sherman; John J. Hautala; Simon Ruffell
Archive | 2014
Steven R. Sherman; Simon Ruffell; John J. Hautala; Adam Brand
Archive | 2016
Simon Ruffell; Thomas R. Omstead; Anthony Renau
Archive | 2014
Swaminathan Srinivasan; Fareen Adeni Khaja; Simon Ruffell; John J. Hautala
Archive | 2012
Morgan D. Evans; Simon Ruffell
Archive | 2017
Simon Ruffell; Arvind Kumar; Tristan Ma; Kyu-Ha Shim; John J. Hautala; Steven Sherman
Archive | 2017
Alex Tsung-Liang Chen; Simon Ruffell
Archive | 2016
Simon Ruffell; John J. Hautala; Adam Brand; Huixiong Dai
Archive | 2015
Simon Ruffell
