Abhijit Basu Mallick

High quality silicon oxide films by remote plasma CVD from disilane precursors

Method and system for improving dielectric film quality for void free gap fill

Wet oxidation process performed on a dielectric material formed from a flowable cvd process

Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp ii process

Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for HARP II - remote plasma enhanced deposition processes

Silicon-selective dry etch for carbon-containing films

Doping of dielectric layers

Methods for forming silicon nitride based film or silicon carbon based film

ATOMIC LAYER DEPOSITION OF SILICON NITRIDE USING DUAL-SOURCE PRECURSOR AND INTERLEAVED PLASMA

Methods for Forming a Silicon Oxide Layer Over a Substrate