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Stephan Muellender

Carl Zeiss AG

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Publication

Featured researches published by Stephan Muellender.

Archive | 2013

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION

Dirk Heinrich Ehm; Stephan Muellender; Thomas Stein; Johannes Hubertus Josephina Moors; Dieter Kraus; Richard Versluis; Marcus Gerhardus Hendrikus Meijerink

Archive | 2010

Projection objective and method for its manufacture

Hans-Juergen Mann; Stephan Muellender; Johann Trenkler; Hartmut Enkisch

Archive | 2010

Imaging optical system and projection exposure installation

Hans-Juergen Mann; Wilhelm Ulrich; Stephan Muellender; Hartmut Enkisch

Archive | 2010

Microlithography illumination system and microlithography illumination optical unit

Damian Fiolka; Michael Totzeck; Hartmut Enkisch; Stephan Muellender

Archive | 2012

Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror

Hartmut Enkisch; Stephan Muellender; Martin Endres

Archive | 2012

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

Stephan Muellender; Joern Weber; Wilfried Clauss; Hans-Jochen Paul; Gerhard Braun; Sascha Migura; Aurelian Dodoc; Christoph Zaczek; Gisela von Blanckenhagen; Roland Loercher

Archive | 2007

Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements

Dirk Heinrich Ehm; Hermann Bieg; Hans-Juergen Mann; Stephan Muellender; Johannes Hubertus Josephina Moors

Archive | 2013

Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective

Hartmut Enkisch; Stephan Muellender; Hans-Juergen Mann; Rolf Freimann

Archive | 2013

Imaging optical system and projection exposure system including the same

Hans-Juergen Mann; Wilheim Ulrich; Stephan Muellender; Hartmut Enkisch

Archive | 2010

METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTICAL ARRANGEMENT

Hartmut Enkisch; Stephan Muellender; Martin Endres

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Hartmut Enkisch

Carl Zeiss AG

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Dirk Heinrich Ehm

Carl Zeiss AG

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Hans-Juergen Mann

Carl Zeiss AG

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Dieter Kraus

Carl Zeiss AG

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Marcus Gerhardus Hendrikus Meijerink

Carl Zeiss AG

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Richard Versluis

Carl Zeiss AG

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Thomas Stein

Carl Zeiss AG

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Gisela von Blanckenhagen

Carl Zeiss AG

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Johannes Hubertus Josephina Moors

ASML Holding

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Aurelian Dodoc

Carl Zeiss AG

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