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Steven P. Caliendo

Tokyo Electron

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Publication

Featured researches published by Steven P. Caliendo.

Archive | 2002

Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers

Joseph T. Hillman; John G. North; Steven P. Caliendo; John J. Hautala

Archive | 2007

Method and system for multi-pass correction of substrate defects

Ruairidh MacCrimmon; Nicolaus J. Hofmeester; Steven P. Caliendo

Archive | 2007

Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces

Nicolaus J. Hofmeester; Steven P. Caliendo; Thomas G. Tetreault; Ruairidh MacCrimmon

Archive | 2000

Method for pretreating dielectric layers to enhance the adhesion of CVD metal layers thereto

Richard C. Westhoff; Steven P. Caliendo; Joseph T. Hillman

Archive | 2007

METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFIC PROCESSING OF A PLURALITY OF SUBSTRATES

Nicolaus J. Hofmeester; Steven P. Caliendo

Archive | 2007

METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LOCATION SPECIFIC PROCESSING

Ruairidh MacCrimmon; Nicolaus J. Hofmeester; Steven P. Caliendo

Archive | 2003

Method for stabilizing the internal surface of a PECVD process chamber

Joseph T. Hillman; Steven P. Caliendo; Gerrit J. Leusink

Archive | 2000

Method for improving the adhesion of sputtered copper films to CVD transition metal based underlayers

Joseph T. Hillman; Cory Wajda; Steven P. Caliendo

Archive | 2000

Method for incorporating silicon into CVD metal films

Joseph T. Hillman; Steven P. Caliendo

Archive | 2001

Procede d'incorporation de silicium a des films metalliques deposes par cvd

Joseph T. Hillman; Steven P. Caliendo

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Collaboration

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Joseph T. Hillman

Tokyo Electron

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Nicolaus J. Hofmeester

Tokyo Electron

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Ruairidh MacCrimmon

Tokyo Electron

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Cory Wajda

Tokyo Electron

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Gerrit J. Leusink

Tokyo Electron

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John G. North

Tokyo Electron

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John J. Hautala

Tokyo Electron

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Richard C. Westhoff

Tokyo Electron

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