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Dive into the research topics where Tadao Komeda is active.

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Featured researches published by Tadao Komeda.


Japanese Journal of Applied Physics | 1982

A Low Power 8 Bit Parallel A/D Converter with High Accuracy Process

Toyoki Takemoto; Michihiro Inoue; Hideaki Sadamatsu; Akira Matsuzawa; Tadao Komeda

A high accuracy process offering small ΔVBE of pair transistors, small contact resistance, and uniform reference resistance, has been applied in the design of an 8 bit parallel 40 MHz A/D converter. A new bipolar structure produced by serial implantation of B+ and Ass+ through the same opening window of SiO2 has been developed to realize high speed and high uniformity. An optimized high speed comparator stage was developed in which the number of transistors and power consumption were reduced. Consequently, an 800 mW, 40 MHz sampling frequency, 8 bit A/D converter was developed.


Japanese Journal of Applied Physics | 1981

Flat Emitter Transistor with Self-Aligned Base

Tsutomu Fujita; Haruyasu Yamada; Tadao Komeda; Toyoki Takemoto

A flat emitter transistor with a self-aligned base (FLET) has been developed to realize a high speed and low power dissipation bipolar LSI. This FLET has a flat bottom emitter and eliminates parasitic capacitance in the side wall. Accordingly, current gain (hFE) is almost independent of the emitter size and shape. Moreover, high cut-off frequency (fT) and high hFE can be obtained in low current region. The FLET also has an inactive base of high impurity density formed extremely near the emitter region. As a result, the base resistance can be lowered even though single line base structure is used. This base contact structure enables the reduction of CTC and CTS. The divider using FLET operated at frequencies up to 1.3 GHz. The power dissipation was 125 mW, being one fifth that of the conventional divider.


Archive | 1987

Method of making bipolar transistors

Toyoki Takemoto; Tadao Komeda; Haruyasu Yamada; Tsutomu Fujita


Archive | 1979

Process for fabrication of semiconductors utilizing selectively etchable diffusion sources in combination with melt-flow techniques

Tadao Komeda; Kazufumi Ogawa


Archive | 1989

Method of making semiconductor ic including polar transistors

Toyoki Takemoto; Tadao Komeda; Haruyasu Yamada; Tsutomu Fujita


Archive | 1987

Method for fabricating bipolar semiconductor device

Shuichi Kameyama; Tadao Komeda; Kazuhiro Kobushi; Hiroyuki Sakai


Archive | 1983

Semiconductor ic and method of making the same

Toyoki Takemoto; Tadao Komeda; Haruyasu Yamada; Tsutomu Fujita


Archive | 1989

Method for fabricating a polycrystalline silicon resistor

Kazuhiro Kobushi; Shuichi Kameyama; Tadao Komeda


symposium on vlsi technology | 1987

A Trench Isolation Technology for High-Speed and Low-Power Dissipation Bipolar LSI's

Hiroyuki Sakai; K. Kikuchi; Shuichi Kameyama; M. Kajiyama; Tadao Komeda


Archive | 1978

Integrierte halbleiterschaltung Integrated semiconductor circuit

Tsutomu Fujita; Toyoki Takemoto; Tadao Komeda; Haruyasu Yamada

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Akira Matsuzawa

Tokyo Institute of Technology

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