Tapani Alasaarela

Reduced propagation loss in silicon strip and slot waveguides coated by atomic layer deposition

When silicon strip and slot waveguides are coated with a 50 nm amorphous titanium dioxide (TiO2) film, measured losses at a wavelength of 1.55 μm can be as low as (2 ± 1)dB/cm and (7 ± 2)dB/cm, respectively. We use atomic layer deposition (ALD), estimate the effect of ALD growth on the surface roughness, and discuss the effect on the scattering losses. Because the gap between the rails of a slot waveguide narrows by the TiO2 deposition, the effective slot width can be back-end controlled. This is useful for precise adjustment if the slot is to be filled with, e. g., a nonlinear organic material or with a sensitizer for sensors applications.

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

We demonstrate good optical quality TiO(2) thin films grown by atomic layer deposition at 120 degrees C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53microm. A high quality resonant waveguide grating was fabricated using a thin TiO(2) layer on top of a SiO(2) grating.

Single-layer one-dimensional nonpolarizing guided-mode resonance filters under normal incidence

We demonstrate that properly designed one-dimensional guided-mode resonance filters (GMRFs) with only one grating layer can exhibit a nonpolarizing resonant filtering effect under normal incidence. A sinusoidal profile nonpolarizing GMRF is realized by photoinduced surface-relief grating formation on thin films of polymer-azobenzene complexes and subsequent atomic layer deposition, showing the feasibility of fabrication of such compact GMRFs.

Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition

We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.

Efficient surface structuring and photoalignment of supramolecular polymer–azobenzene complexes through rational chromophore design

Rational selection of the para-substituent of azobenzene chromophores in supramolecular polymeric complexes is exploited to control the chromophore–chromophore intermolecular interactions occurring in the material system. This allows optimizing the material system for either efficient surface-relief formation or for high and stable photoalignment. The surface-relief gratings can be subsequently coated with amorphous TiO2 using atomic layer deposition, resulting in high-quality and high-index organic–inorganic gratings with vastly improved thermal stability compared to all-polymeric gratings.

Angled sidewalls in silicon slot waveguides: conformal filling and mode properties

Effect of angled sidewalls on the filling and properties of silicon slot waveguides is discussed. We demonstrate complete filling of slot waveguide structures with oxide material systems using the atomic layer deposition technique and discuss use of various slot filling materials. Properties of the optical modes in angled-sidewall slot waveguides are studied. Enhanced vertical confinement is obtained with certain waveguide parameters. The reduced effective mode area enhances e.g. nonlinear effects in the waveguide. We discuss the use of atomic layer deposition in realization of filled slot waveguides optimized for all-optical functionalities.

Towards athermal organic-inorganic guided mode resonance filters

We demonstrate guided-mode resonance filters featuring an amorphous TiO(2) layer fabricated by atomic layer deposition on a polymeric substrate. The thermal properties of such filters are studied in detail by taking into account both thermal expansion of the structure and thermo-optic coefficients of the materials. We show both theoretically and experimentally that these two effects partially compensate for each other, leading to nearly athermal devices. The wavelength shift of the resonance reflectance peak (< 1 nm) is a small fraction of the peak width (~11 nm) up to temperatures exceeding the room temperature by tens of degrees centigrade.

Enhancement of the third-order optical nonlinearity in ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition

We investigate the third-order optical nonlinearity in ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition and show that the third-order optical nonlinearity can be enhanced by nanoscale engineering of the thin film structure. The grain size of the polycrystalline ZnO film is controlled by varying the thickness of the ZnO layers in the nanolaminate in which thin (∼2 nm) amorphous Al2O3 layers work as stopping layers for ZnO crystal growth. Nanoscale engineering enables us to achieve a third harmonic generated signal enhancement of ∼13 times from the optimized nanolaminate structure compared to a ZnO reference film of comparable thickness.

High quality crystallinity controlled ALD TiO2 for waveguiding applications

We demonstrate a novel atomic layer deposition (ALD) process to make high-quality nanocrystalline titanium dioxide (TiO(2)) with intermediate Al(2)O(3) layers to limit the crystal size. The process is based on titanium chloride (TiCl(4))+water and trimethyl aluminum (TMA)+ozone processes at 250°C deposition temperature. The waveguide losses measured using a prism coupling method for 633 and 1551 nm wavelengths are as low as 0.2±0.1 dB/mm with the smallest crystal size, with losses increasing with crystal size. In comparison, plain TiO(2) deposited at 250°C without the intermediate Al(2)O(3) layers shows high scattering losses and is not viable as waveguide material. The third-order optical nonlinearity decreases with smaller crystal size as verified by third-harmonic generation microscopy but still remains high for all samples. Crystallinity controlled ALD-grown TiO(2) is an excellent candidate for various optical applications, where good thermal stability and high third-order optical nonlinearity are needed.

Feature size reduction of silicon slot waveguides by partial filling using atomic layer deposition

We propose a novel method to realize silicon-on-insulator (SOI)-based air slot waveguides for sensing applications. The method, based on feature size reduction using conformal thin films grown by atomic layer deposition (ALD), enables a guided slot mode in a silicon slot waveguide with a patterned slot width of more than 200 nm. Feature size reduction of slot structures with ALD grown amorphous TiO2 is demonstrated.