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Dive into the research topics where Thomas Harold Newman is active.

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Featured researches published by Thomas Harold Newman.


SPIE's 1994 Symposium on Microlithography | 1994

Quantitative stepper metrology using the focus monitor test mask

Timothy A. Brunner; Alexander Lee Martin; Ronald M. Martino; Christopher P. Ausschnitt; Thomas Harold Newman; Michael S. Hibbs

A new lithographic test pattern, the focus monitor, is introduced. Through the use of phase shift techniques, focus errors translate into easily measurable overlay shifts in the printed pattern. Each individual focus monitor pattern can be directly read for the sign and magnitude of the focus error. This paper presents a detailed verification of the validity of this approach, along with several preliminary applications.


Archive | 1994

Water-soluble electrically conducting polymers, their synthesis and use

Marie Angelopoulos; Jeffrey D. Gelorme; Thomas Harold Newman; Niranjan M. Patel; David E. Seeger


Archive | 1994

High resolution phase edge lithography without the need for a trim mask

Richard A. Ferguson; Lars W. Liebmann; Ronald M. Martino; Thomas Harold Newman


SPIE's 1994 Symposium on Microlithography | 1994

Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs

Lars W. Liebmann; Thomas Harold Newman; Richard A. Ferguson; Ronald M. Martino; Antoinette F. Molless; Mark O. Neisser; J. Tracy Weed


Archive | 1995

Crosslinked water-soluble electrically conducting polymers

Marie Angelopoulos; Jeffrey D. Gelorme; Thomas Harold Newman; Niranjan M. Patel; David E. Seeger


Archive | 1997

Water-soluble conductive polymer composition, its production and utilization

Marie Angelopoulos; Jeffrey D. Gelorme; Thomas Harold Newman; Niranjan M. Patel; David E. Seeger; ドナルド ジェロルム ジェフリー; アール シージャー デイヴィッド; ハロルド ニューマン トーマス; モハンラル パテル ニランジャン; アンゲロポロス マリー


Archive | 1995

High resolution trim-less phase edge lithography method

Richard A. Ferguson; Lars W. Liebmann; Ronald M. Martino; Thomas Harold Newman; トーマス・ハロルド・ニューマン; ラース・ウルフギャング・リーブマン; リチャード・アラン・ファーガソン; ロナルド・マイケル・マルティーノ


Archive | 1995

高解像度の位相エッジ・トリムレス・リソグラフィ方法

Richard A. Ferguson; Lars W. Liebmann; Ronald M. Martino; Thomas Harold Newman; トーマス・ハロルド・ニューマン; ラース・ウルフギャング・リーブマン; リチャード・アラン・ファーガソン; ロナルド・マイケル・マルティーノ


Archive | 1995

Hoch auflösende Phasenverschiebungslithographie ohne Korrekturmaske

Richard A. Ferguson; Ronald M. Martino; Lars W. Liebmann; Thomas Harold Newman


Archive | 1995

Lithographie à décalage de phase à haute résolution ne nécessitant pas de masque de correction

Richard A. Ferguson; Ronald M. Martino; Lars W. Liebmann; Thomas Harold Newman

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