Tom Choi

Trilayer resist organic layer etch

Method for improving uniformity and reducing etch rate variation of etching polysilicon

Vacuum plasma processor apparatus and method

Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking

Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof

In-situ photoresist strip during plasma etching of active hard mask

Semiconductor processing including etched layer passivation using self-assembled monolayer

PULSED DIELECTRIC ETCH PROCESS FOR IN-SITU METAL HARD MASK SHAPE CONTROL TO ENABLE VOID-FREE METALLIZATION

ORGANIC LAYER ETCHING BY THREE-LAYER RESIST

Pulsed dielectric etch process for in-situ metal hard mask shape control