Ung Hwan Pi
Electronics and Telecommunications Research Institute
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Publication
Featured researches published by Ung Hwan Pi.
Applied Physics Letters | 2005
Han Young Yu; Byung Hyun Kang; Ung Hwan Pi; Chan Woo Park; Sung-Yool Choi; Gyu Tae Kim
The electrical responses of vanadium pentoxide nanowires to helium gas and environmental pressures are demonstrated. The devices feature well-aligned nanowires that are oriented by electrophoresis technique in the submicron scale. The electrical conductance is found to increase and decrease upon exposure to helium gas and air, respectively. This electrical response to helium is due to physical adsorption of the helium atoms into the interlayer of vanadium pentoxide nanowires. Furthermore, we observe flow-rate-dependent conductance variations such that the conductance is increased with stepwise behavior to the increase of flow rate of helium.
Japanese Journal of Applied Physics | 2010
Sung Chul Lee; Young-Jin Cho; Ung Hwan Pi; Ji Young Bae; Jinseong Heo; Sunae Seo; Jae Kwang Shin; Taek Dong Lee
As an alternative to current or static magnetic field driven domain wall (DW) motion, we studied the dynamics of DW motion under an in-plane rotating magnetic field (IRMF) in a metallic nanowire with a perpendicular magnetic anisotropy. An equation describing the DW motion was obtained with a one-dimensional analytical model based on a collective coordinate approach. The DW velocity can easily be controlled up to hundreds of meters per second by varying the IRMF amplitude and frequency. The validity of the equation for DW motion was confirmed with micromagnetic simulations.
Japanese Journal of Applied Physics | 2006
Chan Woo Park; Jungwook Lim; Han Young Yu; Ung Hwan Pi; Min Ki Ryu; Sung-Yool Choi
We propose a new fabrication process of nano-gap electrode pairs using an atomic-layer-deposited (ALD) sacrificial layer and the shadow deposition technique. In this process, gap width can be precisely controlled by the number of deposition cycles of the ALD process, whereas junction area is defined by the deposition angle of the second electrode material through an overhanging shadow mask on top of the first electrode. In comparison with our previous method, process reliability has been highly improved because the unintentional deposition of the second electrode material on the sidewall of the first electrode is completely prevented. We have fabricated 10 ×10 arrays of n-type polycrystalline silicon (n-poly-Si)/Au nano-gap electrode pairs with gap widths of 6 and 9 nm, which show good insulating properties at room temperature.
Archive | 2005
Sung-Yool Choi; Chan Woo Park; Han Young Yu; Ung Hwan Pi
Archive | 2006
Chan Woo Park; Sung-Yool Choi; Sang Ouk Ryu; Han Young Yu; Ung Hwan Pi; Tae Hyoung Zyung
Surface Science | 2005
Ung Hwan Pi; Mun Seok Jeong; Jaehyeon Kim; Han Young Yu; Chan Woo Park; Hyoyoung Lee; Sung-Yool Choi
Applied Surface Science | 2006
Yong Kwan Kim; Jae Pil Koo; Chul Joon Huh; Jeong Sook Ha; Ung Hwan Pi; Sung-Yool Choi; JunHo Kim
Archive | 2005
Chan Woo Park; Sung-Yool Choi; Han Young Yu; Ung Hwan Pi
Nanotechnology | 2005
Chan Woo Park; Han Young Yu; Ung Hwan Pi; Sung-Yool Choi
Archive | 2006
Han Young Yu; In Bok Baek; Chang Geun Ahn; Ki Ju Im; Jong Heon Yang; Ung Hwan Pi; Min Ki Ryu; Chan Woo Park; Sung-Yool Choi; Seongjae Lee