Vishnu K. Agarwal

Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers

Metal oxynitride capacitor barrier layer

Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell

Photo-assisted remote plasma apparatus and method

Structurally-stabilized capacitors and method of making of same

Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines

Method and structure for reducing contact aspect ratios

Method and apparatus for endpointing a chemical-mechanical planarization process

Methods for forming rough ruthenium-containing layers and structures/methods using same

Semiconductor container structure with diffusion barrier