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Vogt Mirko

Infineon Technologies

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Publication

Featured researches published by Vogt Mirko.

Archive | 2004

Production of a first contact perforated surface in a storage device having storage cells comprises preparing a semiconductor substrate with an arrangement of gate electrode strips on the semiconductor surface, and further processing

Graf Werner; Heineck Lars; Genz Oliver; Stavrev Momtchil; Vogt Mirko

Archive | 2003

Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte

Kirchhoff Markus; Wege Stephan; Stegemann Maik; Vogt Mirko

Archive | 2002

Herstellungsverfahren für eine integrierte Schaltung

Lehr Matthias Uwe; Tews Rene; Vogt Mirko

Archive | 2000

Production of integrated circuit comprises applying metallization layers to circuit substrate, and forming hard mask at predetermined temperature which effects phase conversion

Lehr Matthias Uwe; Tews Rene; Vogt Mirko

Archive | 2005

Production of a layer structure for DRAM memory chips comprises depositing an amorphous silicon layer on a substrate using a PECVD method and structuring the silicon layer to form a hard mask

Vogt Mirko

Archive | 2003

Plasmaangeregtes chemisches Gasphasenabscheide-Verfahren zum Abscheiden von Siliziumnitrid oder Siliziumoxinitrid, Verfahren zum Herstellen einer Schicht-Anordnung und Schicht-Anordnung

Vogt Mirko

Archive | 2003

Silicon-containing layer manufacture using photomask, forms silicon-containing layer on substrate by chemical vapour deposition and uses excess silicon to reduce light used for exposing photomask

Vogt Mirko

Archive | 2003

Production of structured layer on semiconductor substrate by forming acid-forming photoresist layer on structured layer, exposing the photoresist layer to light, and removing acid-containing region with lye

Vogt Mirko

Archive | 2003

Method for producing a structured layer on a semiconductor substrate

Vogt Mirko

Archive | 2018

Drucksensorvorrichtung und Herstellungsverfahren

Kautzsch Thoralf; Vogt Mirko; Stegemann Maik; Roeth Andre; Haubold Marco; Froehlich Heiko

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Collaboration

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Stegemann Maik

Infineon Technologies

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Wege Stephan

Infineon Technologies

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Kautzsch Thoralf

Infineon Technologies

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Kirchhoff Markus

Infineon Technologies

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Froehlich Heiko

Infineon Technologies

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Katzwinkel Frank

Infineon Technologies

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Lehr Matthias Uwe

Infineon Technologies

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Stavrev Momtchil

Infineon Technologies

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Tews Rene

Infineon Technologies

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Bieselt Steffen

Infineon Technologies

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