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Weber Ulrich

Carl Zeiss AG

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Publication

Featured researches published by Weber Ulrich.

Archive | 2003

Abbildungseinrichtung in einer Projektionsbelichtungsanlage

Hummel Wolfgang; Fischer Juergen; Aubele Karl-Eugen; Merz Erich; Raoul Reiner; Rief Klaus; Schoengart Stefan; Neumaier Markus; Trossbach Baerbel; Rassel Thorsten; Weber Ulrich; Muehlbeyer Michael; Holderer Hubert; Kohl Alexander; Weber Jochen; Lippert Johannes

Archive | 2003

Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur

Weber Ulrich; Holderer Hubert; Muenker Hartmut

Archive | 2000

Vorrichtung zum Kippen eines Gegenstandes um wenigstens eine Achse, insbesondere eines optischen Elementes

Weber Ulrich

Archive | 2004

Vorrichtung zur Positionierung eines optischen Elements in einer Struktur

Weber Ulrich; Holderer Hubert; Rexhaeuser Dirk

Archive | 2004

Securing optical element holders together using screws, for projection lenses in microlithography, by measuring region of holder surface using interferometric measuring device, and varying torque to achieve uniform interference pattern

Kugler Jens; Weber Ulrich

Archive | 2003

Objektiv, insbesondere projektionsobjektiv für die mikrolithographie

Weber Ulrich

Archive | 2004

Catadioptric projection lens for semiconductor photolithography, has device for absorbing stray light passing through beam splitter, comprising absorbing medium such as eloxal

Holderer Hubert; Schoeppach Armin; Gellrich Bernhard; Gruner Toralf; Brunotte Martin; Weber Ulrich; Ullmann Jens; Maul Manfred; Mathe Gerald

Archive | 2004

Vorrichtung zur Aufnahme eines Strahlteilerelements

Weber Ulrich; Kohl Alexander; Holderer Hubert; Schoeppach Armin; Gaber Erwin; Kaiser Winfried; Garreis Reiner; Gruner Toralf

Archive | 2004

Objective, in particular projection objective for microlithography used in the manufacture of semiconductor components has one housing for optical elements provided with mating surfaces

Weber Ulrich; Kohl Alexander; Holderer Hubert

Archive | 2003

Device for deformation-free mounting of non-rotation symmetrical optical elements has joining elements giving at least 1, maximum 2 degrees of translational freedom, 2 degrees of rotational freedom

Weber Ulrich

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Holderer Hubert

Carl Zeiss AG

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Kohl Alexander

Carl Zeiss AG

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Gellrich Bernhard

Carl Zeiss AG

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Becker Jochen

Carl Zeiss AG

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Gruner Toralf

Carl Zeiss AG

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Kugler Jens

Carl Zeiss AG

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Schoeppach Armin

Carl Zeiss AG

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Aubele Karl-Eugen

Carl Zeiss AG

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Brunotte Martin

Carl Zeiss AG

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Brydon Alan L

Carl Zeiss AG

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