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Publication
Featured researches published by William A. Enichen.
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V | 1995
James D. Rockrohr; Rainer Butsch; William A. Enichen; Michael S. Gordon; Timothy R. Groves; John G. Hartley; Hans C. Pfeiffer
IBMs latest electron beam mask maker, EL-4, is online at IBMs Advanced Mask Facility (AMF) in Essex Junction, Vermont. The EL-4 system is a 75KV shaped beam lithography system utilizing a Variable Axis Immersion Lens (VAIL) designed to produce 1X or NX masks for 0.25 micrometers lithography ground rules, extendable to 0.13 micrometers . It is currently producing NIST-style X-ray membrane masks with pattern sizes over 30 X 30 mm2. This paper will give a brief description of the EL-4 tool and its operating features, specific measures used to enhance tool stability and accuracy, and measurement data from masks recently produced on the tool.
Ibm Journal of Research and Development | 2001
Rajinder S. Dhaliwal; William A. Enichen; Steven D. Golladay; Michael S. Gordon; Rodney A. Kendall; Jon Erik Lieberman; Hans C. Pfeiffer; David J. Pinckney; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler
Archive | 1972
Eugene Edward Cass; William A. Enichen; Janos Havas
Archive | 1993
Ken T. Chan; Donald Eugene Davis; William A. Enichen; Cecil Tzechor Ho; Edward V. Weber; Guenther O. Langner
Archive | 1995
William A. Enichen
Archive | 1996
Samuel Kay Doran; William A. Enichen; Timothy R. Groves; Rodney A. Kendall; Henri Antoine Khoury; Richard D. Moore; Paul F. Petric; James D. Rockrohr
Archive | 1996
Eileen Veronica Clarke; William A. Enichen; John G. Hartley
Archive | 1995
Ken Tze-Kin Chan; William A. Enichen; John G. Hartley; Maris A. Sturans
Archive | 1997
William A. Enichen; Christopher F. Robinson
Archive | 2005
William A. Enichen; Christopher F. Robinson
