Yasutsugu Usami | Researchain

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Featured researches published by Yasutsugu Usami.

Archive | 2001

Inspection method, apparatus and system for circuit pattern

Yasuhiko Nara; Kazuhisa Machida; Mari Nozoe; Hiroshi Morioka; Yasutsugu Usami; Takashi Hiroi; Kohichi Hayakawa; Maki Ito

Archive | 2001

Method and apparatus for inspecting integrated circuit pattern

Hiroyuki Shinada; Mari Nozoe; Haruo Yoda; Kimiaki Ando; Katsuhiro Kuroda; Yutaka Kaneko; Maki Tanaka; Shunji Maeda; Hitoshi Kubota; Aritoshi Sugimoto; Katsuya Sugiyama; Atsuko Takafuji; Yusuke Yajima; Hiroshi Tooyama; Tadao Ino; Takashi Hiroi; Kazushi Yoshimura; Yasutsugu Usami

Archive | 2004

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

Masahiro Watanabe; Takashi Hiroi; Maki Tanaka; Hiroyuki Shinada; Yasutsugu Usami

Archive | 2004

Patterned wafer inspection method and apparatus therefor

Hiroyuki Shinada; Yusuke Yajima; Hisaya Murakoshi; Masaki Hasegawa; Mari Nozoe; Atsuko Takafuji; Katsuya Sugiyama; Katsuhiro Kuroda; Kaoru Umemura; Yasutsugu Usami

Archive | 1999

Projecting type charged particle microscope and projecting type substrate inspection system

Hideo Todokoro; Tohru Ishitani; Yasutsugu Usami; Shunroku Taya; Hiroyuki Shinada; Taku Ninomiya; Tsuyoshi Ohnishi

Archive | 1998

Method of inspecting pattern and apparatus thereof

Chie Shishido; Takashi Hiroi; Haruo Yoda; Masahiro Watanabe; Asahiro Kuni; Maki Tanaka; Takanori Ninomiya; Hideaki Doi; Shunji Maeda; Mari Nozoe; Hiroyuki Shinoda; Atsuko Takafuji; Aritoshi Sugimoto; Yasutsugu Usami

Archive | 2002

Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method

Hiroyuki Suzuki; Hiroyuki Shinada; Atsuko Takafuji; Yasutsugu Usami; Shuji Sugiyama

Archive | 1992

Process and apparatus for transferring an object and for processing semiconductor wafers

Yasutsugu Usami

Archive | 2005

Method and an apparatus of an inspection system using an electron beam

Yuko Iwabuchi; Hideo Todokoro; Hiroyoshi Mori; Mitsugu Sato; Yasutsugu Usami; Mikio Ichihashi; Satoru Fukuhara; Hiroyuki Shinada; Yutaka Kaneko; Katsuya Sugiyama; Atsuko Takafuji; Hiroshi Toyama

Archive | 1998