Yi-Nien Su

Air gap interconnect structure and method thereof

Contact hole structures and contact structures and fabrication methods thereof

DUAL DAMASCENE STRUCTURE FORMED OF LOW-K DIELECTRIC MATERIALS

Fin filled effect transistor and method of forming the same

Dual damascene interconnect in hybrid dielectric

Low oxygen content photoresist stripping process for low dielectric constant materials

Via hole and trench structures and fabrication methods thereof and dual damascene structures and fabrication methods thereof

Method for photoresist stripping and treatment of low-k dielectric material

Forming a dual damascene structure without ashing-damaged ultra-low-k intermetal dielectric

Method of making dual damascene with via etch through