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Yoichi Osawa

Shin-Etsu Chemical

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Publication

Featured researches published by Yoichi Osawa.

Archive | 2007

Sulfonium salt having polymerizable anion and polymer compound, resist material and method for pattern formation

Jun Hatakeyama; Masaki Ohashi; Yoichi Osawa; Seiichiro Tachibana; Takeshi Watanabe; 正樹 大橋; 洋一 大澤; 誠一郎 橘; 武 渡辺; 畠山 潤

Archive | 2006

NEW SULFONIC ACID SALT AND DERIVATIVE THEREOF, PHOTOACID-GENERATING AGENT AND RESIST MATERIAL USING THE SAME, AND PATTERN-FORMING METHOD

Takeshi Kanou; Katsuhiro Kobayashi; Yoichi Osawa; Takeshi Watanabe; 洋一 大澤; 克浩 小林; 武 渡辺; 剛 金生

Archive | 2008

New photoacid generator, resist material using the same, and pattern forming method

Go Kanao; Masaki Ohashi; Yoichi Osawa; Takeshi Watanabe; 正樹 大橋; 洋一 大澤; 武 渡辺; 剛 金生

Archive | 1996

Sulfonium salts and chemically amplified positive resist compositions

Yoichi Osawa; Satoshi Watanabe; Katsuya Takemura; Shigehiro Nagura; Akinobu Tanaka; Yoshio Kawai

Archive | 2009

Sulfonium salt having polymerizable anion and high molecular compound, resist material, and method for forming pattern

Jun Hatakeyama; Go Kanao; Masaki Ohashi; Yoichi Osawa; Seiichiro Tachibana; 正樹 大橋; 洋一 大澤; 誠一郎 橘; 畠山 潤; 剛 金生

Archive | 2006

Novel sulfonic acid salt and its derivative, photoacid generator, resist material using the same and pattern-forming method

Takeshi Kanou; Katsuhiro Kobayashi; Yoichi Osawa; Takeshi Watanabe; 洋一 大澤; 克浩 小林; 武 渡辺; 剛 金生

Archive | 2007

New photo-acid generator and resist material using the same and pattern-forming method

Koji Hasegawa; Masaki Ohashi; Yoichi Osawa; Takeshi Watanabe; 正樹 大橋; 洋一 大澤; 武 渡辺; 幸士 長谷川

Archive | 2009

New photoacid generator, resist material, and patterning process

Koji Hasegawa; Go Kanao; Masaki Ohashi; Yoichi Osawa; Takeshi Watanabe; 正樹 大橋; 洋一 大澤; 武 渡辺; 剛 金生; 幸士 長谷川

Archive | 2008

Sulfonium salt-containing polymer compound, resist material, and pattern forming process

Jun Hatakeyama; Go Kanao; Yoichi Osawa; Seiichiro Tachibana; 洋一 大澤; 誠一郎 橘; 畠山 潤; 剛 金生

Archive | 2002

Photo acid generating agent compound, chemical amplification positive type resist material and method for forming pattern

Jun Hatakeyama; Tomohiro Kobayashi; Yoichi Osawa; 洋一 大澤; 知洋 小林; 畠山 潤

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Collaboration

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Masaki Ohashi

Shin-Etsu Chemical

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Satoshi Watanabe

Shin-Etsu Chemical

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Jun Hatakeyama

Shin-Etsu Chemical

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Koji Hasegawa

Shin-Etsu Chemical

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Shigehiro Nagura

Shin-Etsu Chemical

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Masayoshi Sagehashi

Shin-Etsu Chemical

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Seiichiro Tachibana

Shin-Etsu Chemical

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Tomohiro Kobayashi

Shin-Etsu Chemical

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Keiichi Masunaga

Shin-Etsu Chemical

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Toshinobu Ishihara

East Tennessee State University

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