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Dive into the research topics where 由弘 有本 is active.

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Featured researches published by 由弘 有本.


Archive | 1995

METHOD FOR CLEANING SUBSTRATE AFTER CHEMICAL AND MECHANICAL POLISHING

Yoshihiro Arimoto; Wataru Nakamura; 亘 中村; 由弘 有本


Archive | 1996

Grinding agent, grinding method and manufacture of semiconductor device

Yoshihiro Arimoto; Kenzo Hanawa; Akira Hatada; Sadahiro Kishii; Wataru Nakamura; Shigeo Ueda; 亘 中村; 健三 塙; 貞浩 岸井; 由弘 有本; 成生 植田; 明良 畑田


Archive | 1997

Abrasive, polishing method, and production of semiconductor device

Yoshihiro Arimoto; Kenzo Hanawa; Akira Hatada; Sadahiro Kishii; Wataru Nakamura; Rintarou Suzuki; Shigeo Ueda; 亘 中村; 健三 塙; 貞浩 岸井; 由弘 有本; 成生 植田; 明良 畑田; 隣太郎 鈴木


Archive | 2005

Ferroelectric memory, method of recording multi-value data, and method of reading the multi-value data

Koji Aizawa; Yoshihiro Arimoto; Satoshi Hasegawa; Hirosane Hoko; Hiroshi Ishihara; Yasuo Nara; Yoshiaki Tabuchi; Norihiro Takahashi; Tetsuro Tamura; Masaomi Yamaguchi; 安雄 奈良; 正臣 山口; 康治 會澤; 由弘 有本; 哲朗 田村; 良志明 田渕; 石原 宏; 宏真 鉾; 聡志 長谷川; 憲弘 高橋


Archive | 1992

Apparatus and method of polishing

Yoshihiro Arimoto; Sadahiro Kishii; 貞浩 岸井; 由弘 有本


Archive | 1996

Abrasive cloth, surface processing method of abrasive cloth, and washing method of abrasive cloth

Yoshihiro Arimoto; Sadahiro Kishii; Wataru Nakamura; 亘 中村; 貞浩 岸井; 由弘 有本


Archive | 1993

Polishing method, polishing device, and body to be polished therefor

Yoshihiro Arimoto; Hiroshi Horie; Masahiko Imai; Sadahiro Kishii; Akira Oishi; Fumitoshi Sugimoto; 雅彦 今井; 博 堀江; 明良 大石; 貞浩 岸井; 由弘 有本; 文利 杉本


Archive | 1992

Apparatus and method of polishing and semiconductor device

Yoshihiro Arimoto; Hiroshi Horie; Sadahiro Kishii; Fumitoshi Sugimoto; 博 堀江; 貞浩 岸井; 由弘 有本; 文利 杉本


Archive | 1991

Semiconductor substrate manufacturing method and device

Yoshihiro Arimoto; Jiyunji Fukuroda; Maki Murakado; 由弘 有本; 真樹 村▲角▼; 淳史 袋田


Extended Abstracts of International Conference on Solid State Devices and Materials | 2011

Mn2O3 Slurry Reuse for SiO2 Film CMP

Sadahiro Kishii; Ko Nakamura; Kenzo Hanawa; Satoru Watanabe; Yoshihiro Arimoto; Syuhei Kurokawa; Toshiro Doi; 貞浩 岸井; 亘 中村; 健三 塙; 悟 渡辺; 由弘 有本; 周平 黒川; 俊郎 土肥

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Hiroshi Ishihara

Tokyo Institute of Technology

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