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Dive into the research topics where Akihito Yamamoto is active.

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Featured researches published by Akihito Yamamoto.


international solid-state circuits conference | 2017

23.5 A 4Gb LPDDR2 STT-MRAM with compact 9F2 1T1MTJ cell and hierarchical bitline architecture

Kwang-Myoung Rho; Kenji Tsuchida; Dong-Keun Kim; Yutaka Shirai; Ji-Hyae Bae; Tsuneo Inaba; Hiromi Noro; Hyunin Moon; Sung-Woong Chung; Kazumasa Sunouchi; Jin Won Park; Ki-Seon Park; Akihito Yamamoto; Seoung-Ju Chung; Hyeongon Kim; Hisato Oyamatsu; Jonghoon Oh

Spin-transfer torque magnetic RAM (STT-MRAM) is one of the most promising nonvolatile memories with guaranteed high-speed read and write operations. Along with performance improvements in the tunnel magnetoresistance (TMR) and the magnetic tunnel junctions (MTJ) required switching current, there have also been reports on high-capacity (up to tens of Mb) STT-MRAM [1–4]. In [2] a perpendicular-TMR (pMTJ) device is used to reduce the switching current and a high-speed current sense amplifier is proposed. In [3] a 54nm 2T-1MTJ 14F2-cell is proposed that uses a high-density DRAM process: self-aligned contact and plug process. However, the unit cell area of STT-MRAM is still much larger than that of DRAM, making STT-MRAM not cost-competitive to contemporary DRAM.


international symposium on semiconductor manufacturing | 2001

Gas cleaning technique for batch furnace at Agile-fab concept manufacturing

Takashi Nakao; Shuji Katsui; Masaki Kamimura; Akihito Yamamoto; Yoshitaka Tsunashima; Yuichi Mikata

To satisfy both the quick turn around time and the process compatibility with the current product line at LPCVD process, the mini-batch furnace is one of the reasonable options. For the high tool utility and the capital scalability at small manufacturing line, the minibatch furnaces are required short time and high frequency tool cleaning for the low machine down time and process commonality for different kind of films LPCVD. In this paper, the short time and high frequency tool cleaning is proposed not only for productivity but also for particle controls.


Archive | 2007

Semiconductor Memory and Method of Manufacturing the Same

Masahiro Kiyotoshi; Akihito Yamamoto; Yoshio Ozawa; Fumitaka Arai; Riichiro Shirota


Archive | 1994

Thermal processing method and apparatus therefor

Kenichi Yamaga; Yuichi Mikata; Akihito Yamamoto


Archive | 1993

Method for heat treating a semiconductor substrate to reduce defects

Souichi Nadahara; Kikuo Yamabe; Hideyuki Kobayashi; Kunihiro Terasaka; Akihito Yamamoto; Naohiko Yasuhisa


Archive | 1993

Treating semiconductor substrate in gas atmos. - to suppress formation of bulk micro defects

Souichi Nadahara; Kikuo Yamabe; Hideyuki Kobayashi; Kunihiro Terasaka; Akihito Yamamoto; Naohiko Yasuhisa


Archive | 1996

Semiconductor substrate and method of processing the same

Souichi Nadahara; Kikuo Yamabe; Hideyuki Kobayashi; Kunihiro Terasaka; Akihito Yamamoto; Naohiko Yasuhisa


Archive | 1997

Method of heat treating a semiconductor wafer to reduce stress

Yuichi Mikata; Akihito Yamamoto


Archive | 1996

Semiconductor device applied to composite insulative film manufacturing method thereof

Yoshio Kasai; Takashi Suzuki; Takanori Tsuda; Yuuichi Mikata; Hiroshi Akahori; Akihito Yamamoto


Archive | 1999

Apparatus for heat treating a semiconductor wafer to reduce stress

Yuichi Mikata; Akihito Yamamoto

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